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公开(公告)号:US11329455B2
公开(公告)日:2022-05-10
申请号:US16867666
申请日:2020-05-06
Applicant: STMicroelectronics (Crolles 2) SAS
Inventor: Mathias Prost , Moustafa El Kurdi , Philippe Boucaud , Frederic Boeuf
IPC: H01S5/227 , H01S5/32 , H01S5/02 , H01S5/042 , H01S5/30 , H01S5/10 , G02B6/136 , G02B6/12 , G02B6/10
Abstract: A germanium waveguide is formed from a P-type silicon substrate that is coated with a heavily-doped N-type germanium layer and a first N-type doped silicon layer. Trenches are etched into the silicon substrate to form a stack of a substrate strip, a germanium strip, and a first silicon strip. This structure is then coated with a silicon nitride layer.
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公开(公告)号:US20210119416A1
公开(公告)日:2021-04-22
申请号:US16757308
申请日:2017-10-19
Applicant: STMicroelectronics (Crolles 2) SAS , CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE , Universite Paris-Saclay
Inventor: Anas Elbaz , Moustafa El Kurdi , Abdelhanin Aassime , Philippe Boucaud , Frederic Boeuf
Abstract: A structure includes a semiconductor support, a semiconductor region overlying the semiconductor support, a silicon nitride layer surrounding and straining the semiconductor region, and a metal foot separating the silicon nitride layer from the semiconductor support. The semiconductor region includes germanium. The semiconductor region can be a resonator of a laser or a waveguide.
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公开(公告)号:US11165220B2
公开(公告)日:2021-11-02
申请号:US16757308
申请日:2017-10-19
Applicant: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE , STMicroelectronics (Crolles 2) SAS , Universite Paris-Saclay
Inventor: Anas Elbaz , Moustafa El Kurdi , Abdelhanin Aassime , Philippe Boucaud , Frederic Boeuf
Abstract: A structure includes a semiconductor support, a semiconductor region overlying the semiconductor support, a silicon nitride layer surrounding and straining the semiconductor region, and a metal foot separating the silicon nitride layer from the semiconductor support. The semiconductor region includes germanium. The semiconductor region can be a resonator of a laser or a waveguide.
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公开(公告)号:US10686297B2
公开(公告)日:2020-06-16
申请号:US15555639
申请日:2015-03-06
Applicant: STMicroelectronics (Crolles 2) SAS , Centre National de la Recherche Scientifique , Universite Paris SUD
Inventor: Mathias Prost , Moustafa El Kurdi , Philippe Boucaud , Frederic Boeuf
IPC: H01S5/10 , G02B6/12 , H01S5/32 , H01S5/02 , H01S5/042 , H01S5/227 , H01S5/30 , G02B6/136 , G02B6/10
Abstract: A germanium waveguide is formed from a P-type silicon substrate that is coated with a heavily-doped N-type germanium layer and a first N-type doped silicon layer. Trenches are etched into the silicon substrate to form a stack of a substrate strip, a germanium strip, and a first silicon strip. This structure is then coated with a silicon nitride layer.
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公开(公告)号:US20180048123A1
公开(公告)日:2018-02-15
申请号:US15555639
申请日:2015-03-06
Applicant: STMicroelectronics (Crolles 2) SAS , Centre National de la Recherche Scientifique , Universite Paris SUD
Inventor: Mathias Prost , Moustafa El Kurdi , Philippe Boucaud , Frederic Boeuf
Abstract: A germanium waveguide is formed from a P-type silicon substrate that is coated with a heavily-doped N-type germanium layer and a first N-type doped silicon layer. Trenches are etched into the silicon substrate to form a stack of a substrate strip, a germanium strip, and a first silicon strip. This structure is then coated with a silicon nitride layer.
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