公开(公告)号：US20220102112A1

公开(公告)日：2022-03-31

申请号：US17483293

申请日：2021-09-23

Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.

Inventor： Aki Ninomiya ,  Takanori Yagita ,  Takao Morita ,  Sayumi Hirose

IPC: H01J37/317 ,  H01J37/304 ,  H01J37/22

Abstract: There is provided an ion implanter including a beamline unit that transports an ion beam, an implantation processing chamber in which an implantation process of irradiating a wafer with an ion beam is performed, an illumination device that performs irradiation with illumination light in a direction intersecting with a transport direction of the ion beam in at least one of the beamline unit and the implantation processing chamber, an imaging device that generates a captured image captured by imaging a space through which the illumination light passes, and a control device that detects a particle which scatters the illumination light, based on the captured image.

公开(公告)号：US11699569B2

公开(公告)日：2023-07-11

申请号：US17483293

申请日：2021-09-23

Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.

Inventor： Aki Ninomiya ,  Takanori Yagita ,  Takao Morita ,  Sayumi Hirose

IPC: H01J37/317 ,  H01J37/22 ,  H01J37/304

CPC classification number: H01J37/3171 ,  H01J37/222 ,  H01J37/304 ,  H01J2237/20207

Abstract: There is provided an ion implanter including a beamline unit that transports an ion beam, an implantation processing chamber in which an implantation process of irradiating a wafer with an ion beam is performed, an illumination device that performs irradiation with illumination light in a direction intersecting with a transport direction of the ion beam in at least one of the beamline unit and the implantation processing chamber, an imaging device that generates a captured image captured by imaging a space through which the illumination light passes, and a control device that detects a particle which scatters the illumination light, based on the captured image.