公开(公告)号：US20240234106A9

公开(公告)日：2024-07-11

申请号：US18278276

申请日：2022-03-11

Applicant: LAM RESEARCH CORPORATION

Inventor： Karl Frederick LEESER ,  Richard BLANK ,  Jacob L. HIESTER

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/458 ,  C23C16/50 ,  C23C16/52 ,  H01L21/683

CPC classification number: H01J37/32715 ,  C23C16/45565 ,  C23C16/4583 ,  C23C16/50 ,  C23C16/52 ,  H01J37/3244 ,  H01J37/32541 ,  H01J37/32568 ,  H01L21/6833 ,  H01J2237/2007 ,  H01J2237/20207

Abstract: A system comprises a pedestal and a controller. The pedestal is arranged below a showerhead in a processing chamber and includes at least three electrodes to clamp a substrate to the pedestal during processing. The controller is configured to measure a pedestal-to-showerhead gap and at least one of a magnitude and a direction of a relative tilt between the pedestal and the showerhead by sensing impedances between the at least three electrodes and the showerhead.

公开(公告)号：US20240170269A1

公开(公告)日：2024-05-23

申请号：US17990536

申请日：2022-11-18

Applicant: Applied Materials, Inc.

Inventor： Harish PENMETHSA

IPC: H01J37/34 ,  C23C14/35 ,  H01J37/32

CPC classification number: H01J37/3426 ,  C23C14/35 ,  H01J37/32082 ,  H01J37/3244 ,  H01J37/32715 ,  H01J37/3405 ,  H01J37/3455 ,  H01J37/347 ,  H01J2237/2007 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/332

Abstract: A physical vapor deposition (PVD) chamber deposits thin films on substrates having through-vias (TVs) formed therethrough in an electronic device fabrication process. More particularly, apparatus and methods improve film deposition uniformity when the TVs have a high aspect ratio or are otherwise shaped in a manner that can decrease the deposition of sputtered material. A sacrificial plate is used below the substrate in a manner whereby material is sputtered into the TVs from below in addition to the conventional top-down sputtering.

公开(公告)号：US11837437B2

公开(公告)日：2023-12-05

申请号：US17832001

申请日：2022-06-03

Applicant: JEOL Ltd.

Inventor： Tatsuhito Kimura ,  Munehiro Kozuka ,  Tsutomu Negishi ,  Hisashi Kawahara

IPC: H01J37/304 ,  H01J37/08 ,  H01J37/20 ,  H01J37/22

CPC classification number: H01J37/304 ,  H01J37/08 ,  H01J37/20 ,  H01J37/222 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/20207 ,  H01J2237/30405 ,  H01J2237/30472

Abstract: A specimen machining device for machining a specimen by irradiating the specimen with an ion beam includes an ion source for irradiating the specimen with the ion beam, a specimen stage for holding the specimen, a camera for photographing the specimen, an information provision unit for providing information indicating an expected machining completion time, and a storage unit for storing past machining information. The information provision unit performs processing for calculating the expected machining completion time based on the past machining information, processing for acquiring an image photographed by the camera, processing for calculating a machining speed based on the acquired image, and processing for updating the expected machining completion time based on the machining speed.

公开(公告)号：US11742172B2

公开(公告)日：2023-08-29

申请号：US17421147

申请日：2019-01-11

Applicant: Hitachi High-Tech Corporation

Inventor： Takashi Dobashi ,  Hirokazu Tamaki ,  Hiromi Mise

IPC: H01J37/20 ,  G06T7/73 ,  G01N23/04 ,  G01N23/06 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/20 ,  G01N23/04 ,  G01N23/06 ,  G06T7/74 ,  H01J37/222 ,  H01J37/26 ,  G01N2223/04 ,  G01N2223/10 ,  G01N2223/3306 ,  G01N2223/418 ,  G06T2207/10061 ,  H01J2237/20207

Abstract: A charged particle beam device includes: a movement mechanism configured to hold and move a sample; a charged particle source configured to emit charged particles with which the sample is irradiated to obtain an image of the sample; and a control unit configured to control the movement mechanism to move the sample and to obtain the image of the sample. The control unit obtains a reference image of the sample in a reference arrangement state by the charged particles, generates a goal image of the sample in a target arrangement state different from the reference arrangement state by calculation from the reference image, moves the sample to each of different arrangement states by the movement mechanism, obtains a candidate image of the sample in each of the different arrangement states by the charged particles, and generates a comparison result between respective candidate images and the goal image.

公开(公告)号：US11699569B2

公开(公告)日：2023-07-11

申请号：US17483293

申请日：2021-09-23

Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.

Inventor： Aki Ninomiya ,  Takanori Yagita ,  Takao Morita ,  Sayumi Hirose

IPC: H01J37/317 ,  H01J37/22 ,  H01J37/304

CPC classification number: H01J37/3171 ,  H01J37/222 ,  H01J37/304 ,  H01J2237/20207

Abstract: There is provided an ion implanter including a beamline unit that transports an ion beam, an implantation processing chamber in which an implantation process of irradiating a wafer with an ion beam is performed, an illumination device that performs irradiation with illumination light in a direction intersecting with a transport direction of the ion beam in at least one of the beamline unit and the implantation processing chamber, an imaging device that generates a captured image captured by imaging a space through which the illumination light passes, and a control device that detects a particle which scatters the illumination light, based on the captured image.

公开(公告)号：US11679489B2

公开(公告)日：2023-06-20

申请号：US17030598

申请日：2020-09-24

Applicant: JEOL Ltd.

Inventor： Tomohisa Fukuda ,  Yuji Konyuba ,  Yuuta Ikeda ,  Tomohiro Haruta

IPC: B25H1/10 ,  G02B21/34 ,  H01J37/20

CPC classification number: B25H1/10 ,  G02B21/34 ,  H01J37/20 ,  H01J2237/20207

Abstract: A retainer is placed on a retainer holding portion formed on a sample chip worktable. With an operation of a button, a take-out support mechanism operates. That is, an upthrust pin moves upward. With this process, an orientation of a sample chip stored in the retainer is changed from a horizontal orientation to an inclined orientation. A plurality of openings through which the upthrust pin passes are formed in the retainer.

公开(公告)号：US20190103246A1

公开(公告)日：2019-04-04

申请号：US16122189

申请日：2018-09-05

Applicant: Hitachi High-Technologies Corporation

Inventor： Motohiro TAKAHASHI ,  Masaki MIZUOCHI ,  Shuichi NAKAGAWA ,  Tomotaka SHIBAZAKI ,  Hironori OGAWA ,  Naruo WATANABE ,  Takanori KATO

IPC: H01J37/20 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/22 ,  H01J37/261 ,  H01J2237/20207 ,  H01J2237/20221 ,  H01J2237/20292 ,  H01J2237/2482

Abstract: The present invention is to provide a stage device capable of improving field-of-view positioning accuracy of a stage having a Z-axis mechanism.The invention is directed to a sample stage device having a first table (105) that moves a sample in a first direction, a second driving mechanism (601) that moves the first table in a second direction different from the first direction, and a part having a function of moving a laser interferometer optical axis (115) that measures the position of the first table, in the second direction.

公开(公告)号：US20180277333A1

公开(公告)日：2018-09-27

申请号：US15936140

申请日：2018-03-26

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Toshiyuki IWAHORI

IPC: H01J37/08 ,  H01J37/20

CPC classification number: H01J37/09 ,  H01J37/08 ,  H01J37/20 ,  H01J37/26 ,  H01J2237/0213 ,  H01J2237/0458 ,  H01J2237/04756 ,  H01J2237/202 ,  H01J2237/20207 ,  H01J2237/28 ,  H01J2237/31749

Abstract: Disclosed herein is a charged particle beam apparatus (10) including: a sample chamber (11); a sample stage (31); an electron beam column (13) irradiating a sample S using an electron beam; and a focused ion beam column (14) irradiating the sample S using a focused ion beam. The apparatus (10) includes an electrode member (45) provided to be displaced between an insertion position between a beam emitting end portion of the electron beam column (13) and the sample stage (31) and a withdrawal position distant from the insertion position, the electrode member being provided with an electrode penetrating hole passing the electron beam therethrough. The apparatus (10) includes: a driving unit (42) displacing the electrode member (45); a power source (20) applying a negative voltage to the electrode member (45); and an insulation member (43) electrically insulating the sample chamber (11)and the driving unit (42) from the electrode member (45).

公开(公告)号：US20180012729A1

公开(公告)日：2018-01-11

申请号：US15700086

申请日：2017-09-09

Applicant: TESCAN ORSAY HOLDING, A.S.

Inventor： Filip LOPOUR ,  Tomas HRNCIR

IPC: H01J37/30 ,  G01N1/32

CPC classification number: H01J37/3005 ,  G01N1/32 ,  H01J2237/20207 ,  H01J2237/304 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: An apparatus for processing a specimen with two or more particle beams, wherein the specimen has a milled side that is processed by a first particle beam and observed by a second particle beam. The specimen is milled during a first milling operation by the first particle beam with the specimen in a first position. Thereafter, the specimen tilts in a second position around an axis of tilt of the specimen. Thereafter, the specimen is milled during a second milling operation. Milling can be performed during continuous tilting of the specimen around the axis of tilt. The axis of tilt of the specimen intersects the milled side. In all the aforementioned positions of the specimen, the second particle beam impinges on the milled side, which enables monitoring of the milling in real time.

公开(公告)号：US20170330724A1

公开(公告)日：2017-11-16

申请号：US15527562

申请日：2015-11-26

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Taiga OKUMURA ,  Takashi OHSHIMA ,  Yuusuke OOMINAMI ,  Minami SHOUJI ,  Akiko HISADA ,  Akio YONEYAMA

IPC: H01J37/28 ,  H01J37/20

CPC classification number: H01J37/28 ,  G01N2223/418 ,  H01J37/20 ,  H01J37/22 ,  H01J37/222 ,  H01J2237/0245 ,  H01J2237/20 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/228 ,  H01J2237/2802

Abstract: An electronic microscope has a great depth of focus compared with an optical microscope. Thus, information is superimposed in the depth direction in one image. Thus, observation of a three-dimensional structure inside a specimen with use of the electronic microscope requires accurate specification of a three-dimensional position or density of a structure inside the specimen. Furthermore, the specimen on a slide glass that is observed with the optical microscope may not be put in a TEM device in the related art. Thus, a very complicated preparation of the specimen is required for performing three-dimensional internal structure observation, with the electronic microscope, of a location that is observed with the optical microscope.Provided is a charged particle beam device including a charged particle optical column that irradiates a specimen with a primary charged particle beam, and a specimen base rotating unit that is capable of rotating the specimen base in a state of an angle formed by a surface of the specimen base and an optical axis of the primary charged particle beam being inclined to a non-perpendicular angle, in which the specimen base is configured to include a detecting element that detects a charged particle scattered or transmitted inside the specimen, and transmitted charged particle images of the specimen corresponding to each angle is acquired by irradiating the specimen in a state of the specimen base rotating unit being rotated at a plurality of different angles.