公开(公告)号：US09837296B2

公开(公告)日：2017-12-05

申请号：US13718071

申请日：2012-12-18

Applicant: Sumitomo Osaka Cement Co., Ltd.

Inventor： Shinichi Maeta ,  Yoshiaki Moriya ,  Kei Furuuchi

IPC: H01L21/683 ,  H01L21/67

CPC classification number: H01L21/6831 ,  H01L21/67248

Abstract: An electrostatic chuck apparatus is disclosed which can be prevented from being damaged or fractured when the temperature abruptly increases or decreases when plasma is irradiated on a plate-like specimen, the heater is heated, or the like, and can also prevent corrosion when a corrosive gas or plasma is provided. The electrostatic chuck apparatus has an electrostatic chuck portion 2 having a mounting plate 11 made of a corrosion-resistant ceramic, a supporting plate 12 which is integrated with the mounting plate 11 so as to support the mounting plate 11 and is made of an insulating ceramic having a larger thermal conductivity than the thermal conductivity of the corrosion-resistant ceramic, and an internal electrode for electrostatic adsorption 13 provided between the mounting plate 11 and the supporting plate 12; and a temperature-controlling base portion 3 which adjusts the electrostatic chuck portion 2 to a desired temperature.

公开(公告)号：US09412635B2

公开(公告)日：2016-08-09

申请号：US14374536

申请日：2013-02-06

Applicant: Tokyo Electron Limited ,  Sumitomo Osaka Cement Co., Ltd.

Inventor： Yasuharu Sasaki ,  Kaoru Oohashi ,  Tomoyuki Takahashi ,  Tadashi Aoto ,  Mamoru Kosakai ,  Shinichi Maeta ,  Yukio Miura ,  Takashi Sato ,  Kei Furuuchi

IPC: H01T23/00 ,  H01L21/683 ,  B23Q3/15 ,  H01L21/67

CPC classification number: H01L21/6833 ,  B23Q3/15 ,  H01L21/67109 ,  H01L21/6831

Abstract: An electrostatic chuck device includes an electrostatic chuck part that has an upper surface as a placement surface for placing a plate-shaped sample and has an internal electrode for electrostatic attraction built therein; and a cooling base part that cools the electrostatic chuck part. The electrostatic chuck part and the cooling base part are integrally adhered to each other via an adhesive layer. An insulator having a double pipe structure including an insulator and an insulator provided coaxially with an outer peripheral portion of the insulator is provided in a cooling gas hole, formed in the electrostatic chuck part and the cooling base part, so as to cover an exposed surface of the adhesive layer on the cooling gas hole side.

Abstract translation: 静电吸盘装置包括具有作为放置板状样品的放置面的上表面并具有内置静电吸引用内部电极的静电吸盘部， 以及冷却静电卡盘部的冷却基部。 静电吸盘部和冷却基部通过粘合层一体地粘接。 具有双管结构的绝缘体包括绝缘体和与绝缘体的外周部同轴设置的绝缘体，设置在形成在静电卡盘部和冷却基部中的冷却气体孔中，以覆盖暴露表面 的冷却气体孔侧的粘合剂层。

公开(公告)号：US20140376148A1

公开(公告)日：2014-12-25

申请号：US14374536

申请日：2013-02-06

Applicant: Tokyo Electron Limited ,  Sumitomo Osaka Cement Co., Ltd.

Inventor： Yasuharu Sasaki ,  Kaoru Oohashi ,  Tomoyuki Takahashi ,  Tadashi Aoto ,  Mamoru Kosakai ,  Shinichi Maeta ,  Yukio Miura ,  Takashi Sato ,  Kei Furuuchi

IPC: H01L21/683

CPC classification number: H01L21/6833 ,  B23Q3/15 ,  H01L21/67109 ,  H01L21/6831

Abstract: An electrostatic chuck device includes an electrostatic chuck part that has an upper surface as a placement surface for placing a plate-shaped sample and has an internal electrode for electrostatic attraction built therein; and a cooling base part that cools the electrostatic chuck part. The electrostatic chuck part and the cooling base part are integrally adhered to each other via an adhesive layer. An insulator having a double pipe structure including an insulator and an insulator provided coaxially with an outer peripheral portion of the insulator is provided in a cooling gas hole, formed in the electrostatic chuck part and the cooling base part, so as to cover an exposed surface of the adhesive layer on the cooling gas hole side.

Abstract translation: 静电吸盘装置包括具有作为放置板状样品的放置面的上表面并具有内置静电吸引用内部电极的静电吸盘部， 以及冷却静电卡盘部的冷却基部。 静电吸盘部和冷却基部通过粘合层一体地粘接。 具有双管结构的绝缘体包括绝缘体和与绝缘体的外周部同轴设置的绝缘体，设置在形成在静电卡盘部和冷却基部中的冷却气体孔中，以覆盖暴露表面 的冷却气体孔侧的粘合剂层。

公开(公告)号：US20130265690A1

公开(公告)日：2013-10-10

申请号：US13718071

申请日：2012-12-18

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Shinichi Maeta ,  Yoshiaki Moriya ,  Kei Furuuchi

IPC: H01L21/683

CPC classification number: H01L21/6831 ,  H01L21/67248

Abstract: An electrostatic chuck apparatus is disclosed which can be prevented from being damaged or fractured when the temperature abruptly increases or decreases when plasma is irradiated on a plate-like specimen, the heater is heated, or the like, and can also prevent corrosion when a corrosive gas or plasma is provided. The electrostatic chuck apparatus has an electrostatic chuck portion 2 having a mounting plate 11 made of a corrosion-resistant ceramic, a supporting plate 12 which is integrated with the mounting plate 11 so as to support the mounting plate 11 and is made of an insulating ceramic having a larger thermal conductivity than the thermal conductivity of the corrosion-resistant ceramic, and an internal electrode for electrostatic adsorption 13 provided between the mounting plate 11 and the supporting plate 12; and a temperature-controlling base portion 3 which adjusts the electrostatic chuck portion 2 to a desired temperature.

Abstract translation: 公开了一种静电吸盘装置，当等离子体照射在板状样品，加热器等上时，当温度突然增加或降低时，可以防止其损坏或断裂，并且还可以防止腐蚀时的腐蚀 提供气体或等离子体。 静电吸盘装置具有静电吸盘部2，该静电卡盘部2具有由耐腐蚀陶瓷构成的安装板11，与安装板11一体形成的支撑板12，以支撑安装板11，并由绝缘陶瓷 具有比耐腐蚀陶瓷的热导率大的热导率和设置在安装板11和支撑板12之间的用于静电吸附的内部电极13; 以及将静电吸盘部2调整到期望温度的温度控制基部3。