公开(公告)号：US20210308812A1

公开(公告)日：2021-10-07

申请号：US17264705

申请日：2019-08-02

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Keisuke MAEDA ,  Masaki OZAKI ,  Masayuki SHIOJIRI ,  Takeshi WATANABE ,  Shinchi MAETA ,  Yuuki KINPARA

IPC: B23Q3/15 ,  H01L21/683 ,  H01J37/32

Abstract: An electrostatic chuck device includes: a mounting table provided with a mounting surface; a focus ring; and a cooling element, in which a holding portion of the mounting table is provided with an annular groove portion surrounding the mounting table, a through-hole that is open on a bottom surface of the groove portion, upper surfaces on both sides of the groove portion in a width direction in the holding portion form a holding surface that comes into contact with the focus ring and holds the focus ring, the holding surface is composed of an inner peripheral surface located further on an inner periphery side than the groove portion and an outer peripheral surface located further on an outer periphery side than the groove portion, and the holding surface satisfies the following conditions (i) and (ii), wherein (i) the holding surface has a shape in which in a cross section in a thickness direction, a straight line connecting a first point corresponding to an innermost periphery of the holding surface and a second point corresponding to an outermost periphery of the holding surface has a positive inclination or a negative inclination from the first point corresponding to the innermost periphery toward the second point corresponding to the outermost periphery, and satisfies 0≤| in the cross section of the holding surface in the thickness direction, a height of the first point corresponding to the innermost periphery−a height of the second point corresponding to the outermost periphery |≤10 μm, (ii) a leak area of the inner peripheral surface and a leak area of the outer peripheral surface are less than 0.7 mm2.