公开(公告)号：US20200317939A1

公开(公告)日：2020-10-08

申请号：US16906374

申请日：2020-06-19

申请人： SUN CHEMICAL CORPORATION

发明人： Michael J. JUREK ,  John G. TIESSEN ,  Soichiro OMIZU ,  Juanita M. PARRIS

IPC分类号： C09D11/101 ,  C09D11/108 ,  C09D11/033 ,  C09D125/06 ,  C09D4/06 ,  C09D7/20

摘要： Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.

公开(公告)号：US20190062518A1

公开(公告)日：2019-02-28

申请号：US16076399

申请日：2017-02-08

申请人： SUN CHEMICAL CORPORATION

发明人： Michael J. JUREK ,  John G. TIESSEN ,  Soichiro OMIZU ,  Juanita M. PARRIS

IPC分类号： C08J11/10 ,  C08F12/08 ,  C08F257/02 ,  C09D11/107 ,  C09D11/037 ,  C09D11/101 ,  C09D151/00

摘要： Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.