公开(公告)号：US20210063863A1

公开(公告)日：2021-03-04

申请号：US17010553

申请日：2020-09-02

申请人： SUSS MicroTec Lithography GmbH

发明人： Isabel AGIREEN ,  Katrin SCHINDLER ,  Wilfried NOELL ,  Sophiane TOURNOIS ,  Susanne WESTENHOEFER

IPC分类号： G03B21/26 ,  G03B21/20 ,  G03B21/14

摘要： A method for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit is disclosed. The method comprises the following steps: At least a predefined portion of the optical projection unit is illuminated so that an image is generated by at least two channels of the predefined portion of the multi-channel optical projection unit. At least one characteristic quantity is determined based on the analysis of the image, wherein a value of the characteristic quantity is associated with a characteristic feature of the projection unit, a defect of the projection unit and/or a defect class of the projection unit. The quality of the projection unit is assessed based on the at least one characteristic quantity. Moreover, a test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit and a computer program are disclosed