公开(公告)号：US20230326784A1

公开(公告)日：2023-10-12

申请号：US18133225

申请日：2023-04-11

Applicant: Samsung Display Co., LTD.

Inventor： SEUNG-WAN KIM ,  EUNHO JUNG ,  JAECHEOL LEE ,  DONGWON HAN

IPC: H01L21/687 ,  H01L21/67

CPC classification number: H01L21/68742 ,  H01L21/67115

Abstract: An exposure apparatus includes a stage on which a target substrate is loaded and in which a plurality of holes are defined, a light source part radiating light to the stage, and a plurality of support pins disposed to penetrate the plurality of holes and supporting the target substrate, the plurality of support pins include a fixed support pin whose position is fixed in a plan view and a first variable support pin capable of reciprocating movement in a first direction, and the plurality of holes include a pair of first holes penetrated by the fixed support pin and arranged side by side at a predetermined interval along the first direction and a second hole penetrated by the first variable support pin and disposed between the pair of first holes.