SPUTTERING APPARATUS AND DISPLAY DEVICE USING THE SAME

    公开(公告)号:US20250160191A1

    公开(公告)日:2025-05-15

    申请号:US18735564

    申请日:2024-06-06

    Abstract: A sputtering apparatus includes a chamber in which a display device is placed and a deposition process is performed on the display device, a gas supply part supplying plasma gas into the chamber, a first target disposed in the chamber and facing the display device, and a plurality of first magnet members disposed inside the first target. The first target includes a first surface facing the display device and a second surface opposite the first surface and facing the plurality of first magnet members, and the first target further includes hollows and protrusions alternately repeated on the first surface.

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