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公开(公告)号：US20240215181A1
公开(公告)日：2024-06-27
申请号：US18239966
申请日：2023-08-30
发明人： JUNGHUN LEE , YOON-JE WOO , DONG-JIN KIM , SUNGSANG AHN , TAEHOON YANG
IPC分类号： H05K5/02
CPC分类号： H05K5/0217 , H10K59/12
摘要： A display device includes: a display module; a first support plate disposed under the display module, and including a first flat part and a ductile part, where the ductile part extends from the first flat part in a first direction and has a plurality of openings defined therein; a second support plate including a second flat part disposed under the first flat part and a plurality of supporting bars disposed under the ductile part and arranged in the first direction; and a resin layer disposed between the first support plate and the second support plate.
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2.发明申请METHOD OF MANUFACTURING TARGET FOR SPUTTERING AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS 审中-公开制造用于喷射的目标的方法和制造有机发光显示装置的方法公开(公告)号：US20150047972A1
公开(公告)日：2015-02-19
申请号：US14276075
申请日：2014-05-13
发明人： SUN-YOUNG JUNG , SANG-WOOK SHIN , IL-SANG LEE , JIN-WOO PARK , DONG-JIN KIM
CPC分类号： C23C14/3414 , B05D5/00 , C23C14/086 , C23C14/3407 , H01J37/3414 , H01J37/3426 , H01L51/5253
摘要： A method of manufacturing a sputtering target includes: preparing a sputtering target material including a low temperature viscosity transition (LVT) inorganic material, melting the sputtering target material at a working pressure that is lower than atmospheric pressure, and processing the melted sputtering target material to thereby form the sputtering target.
摘要翻译： 制造溅射靶的方法包括：制备包括低温粘度转变（LVT）无机材料的溅射靶材料，在低于大气压的工作压力下熔化溅射靶材料，并将熔融的溅射靶材料加工成 从而形成溅射靶。
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