公开(公告)号：US20240324400A1

公开(公告)日：2024-09-26

申请号：US18414037

申请日：2024-01-16

Applicant: Samsung Display Co., LTD.

Inventor： Junghwa PARK ,  Bohwa KIM ,  Jincheol JANG ,  Jaehan LEE

IPC: H10K59/80 ,  H10K59/121 ,  H10K59/124 ,  H10K102/00

CPC classification number: H10K59/872 ,  H10K59/1213 ,  H10K59/124 ,  H10K59/873 ,  H10K2102/311

Abstract: A display apparatus with improved impact resistance includes a substrate, a first semiconductor layer disposed on the substrate, a first inorganic insulating layer disposed on the first semiconductor layer, a first gate layer disposed on the first inorganic insulating layer, having a compressive stress of 470 MPa or more and 1,540 MPa or less, and including molybdenum, and a second inorganic insulating layer disposed on the first gate layer.

公开(公告)号：US20210375950A1

公开(公告)日：2021-12-02

申请号：US17144696

申请日：2021-01-08

Applicant: Samsung Display Co., Ltd.

Inventor： Jaebum HAN ,  Bohwa KIM ,  Younggil PARK ,  Junghwa PARK ,  Nari AHN ,  Sooim JEONG

IPC: H01L27/12

Abstract: A display apparatus is provided which may include a substrate including a display area and a non-display area adjacent to the display area, a first thin-film transistor disposed on the substrate and including a first semiconductor layer including an oxide semiconductor material, and a second thin-film transistor disposed on the substrate and including a second semiconductor layer including a silicon semiconductor material, wherein a surface roughness of the first semiconductor layer is increased by plasma treatment. A method of manufacturing the display apparatus is also provided.