公开(公告)号：US20140320848A1

公开(公告)日：2014-10-30

申请号：US13973533

申请日：2013-08-22

Applicant: Samsung Display Co., Ltd.

Inventor： Ki-Young YEON ,  Nari AHN

IPC: G01N21/95 ,  G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G01N21/94 ,  G01N21/95 ,  G01N2021/8848

Abstract: An apparatus for detecting a crystallizing stain includes a support unit, a crystallized substrate disposed on the support unit, a light source which irradiates polarized light in a predetermined wavelength range to a portion of the crystallized substrate, and a detector which detects the crystallizing stain in the portion of the crystallized substrate, to which the polarized light is irradiated.

Abstract translation: 用于检测结晶污渍的装置包括支撑单元，设置在支撑单元上的结晶基板，将一定波长范围内的偏振光照射到结晶​​基板的一部分的光源，以及检测结晶污点的检测器 结晶基板的被偏振光照射的部分。

公开(公告)号：US20210375950A1

公开(公告)日：2021-12-02

申请号：US17144696

申请日：2021-01-08

Applicant: Samsung Display Co., Ltd.

Inventor： Jaebum HAN ,  Bohwa KIM ,  Younggil PARK ,  Junghwa PARK ,  Nari AHN ,  Sooim JEONG

IPC: H01L27/12

Abstract: A display apparatus is provided which may include a substrate including a display area and a non-display area adjacent to the display area, a first thin-film transistor disposed on the substrate and including a first semiconductor layer including an oxide semiconductor material, and a second thin-film transistor disposed on the substrate and including a second semiconductor layer including a silicon semiconductor material, wherein a surface roughness of the first semiconductor layer is increased by plasma treatment. A method of manufacturing the display apparatus is also provided.