公开(公告)号：US20200248318A1

公开(公告)日：2020-08-06

申请号：US16854342

申请日：2020-04-21

Applicant: Samsung Display Co., Ltd.

Inventor： Jong Hee PARK ,  Jin Seock KIM ,  Bong Won LEE ,  Sang-woo KIM ,  Il-Ryong PARK ,  Bong-Yeon WON ,  Dae-woo LEE

IPC: C23F1/30 ,  H01L27/12 ,  H05K3/06 ,  C23F1/02 ,  H01L21/3213

Abstract: A phosphoric acid-free etchant composition and a method of forming a wiring, the composition including about 40 wt % to about 60 wt % of an organic acid compound; about 6 wt % to about 12 wt % of a glycol compound; about 1 wt % to about 10 wt % of nitric acid, sulfuric acid, or hydrochloric acid; about 1 wt % to about 10 wt % of a nitrate salt compound; and water, all wt % being based on a total weight of the phosphoric acid-free etchant composition.

公开(公告)号：US20180371625A1

公开(公告)日：2018-12-27

申请号：US15970980

申请日：2018-05-04

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jong Hee PARK ,  Jin Seock KIM ,  Bong Won LEE ,  Sang-woo KIM ,  Il-Ryong PARK ,  Bong-Yeon WON ,  Dae-woo LEE

IPC: C23F1/30 ,  C23F1/02 ,  H01L21/3213

Abstract: A phosphoric acid-free etchant composition and a method of forming a wiring, the composition including about 40 wt % to about 60 wt % of an organic acid compound; about 6 wt % to about 12 wt % of a glycol compound; about 1 wt % to about 10 wt % of nitric acid, sulfuric acid, or hydrochloric acid; about 1 wt % to about 10 wt % of a nitrate salt compound; and water, all wt % being based on a total weight of the phosphoric acid-free etchant composition.