公开(公告)号：US20210320268A1

公开(公告)日：2021-10-14

申请号：US17077648

申请日：2020-10-22

Applicant: Samsung Display Co., Ltd.

Inventor： Minkyung KANG ,  Byungsoo SO ,  Jaewoo JEONG ,  Jongjun BAEK ,  Hiroshi OKUMURA

IPC: H01L51/00 ,  H01L27/32 ,  H01L51/56

Abstract: A method of manufacturing a display apparatus includes forming a first substrate on a support substrate; forming a first barrier layer on the first substrate; and forming a conductive layer by implanting n-type impurities or p-type impurities in the first barrier layer and at least a portion of the first substrate. A display apparatus includes a conductive layer arranged on a substrate and a barrier layer arranged on the conductive layer. The conductive layer is doped with n-type impurities when the first barrier layer is doped with n-type impurities, and the conductive layer is doped with p-type impurities when the first barrier layer is doped with p-type impurities.