公开(公告)号：US20190390342A1

公开(公告)日：2019-12-26

申请号：US16434256

申请日：2019-06-07

Applicant: SAMSUNG DISPLAY CO .. LTD.

Inventor： WOO JIN KIM ,  Dong Kyun KO ,  Keun Hee PARK ,  Myung Soo HUH ,  Seon Uk PARK

IPC: C23C16/455 ,  C23C16/50 ,  C23C16/40

Abstract: A thin film processing apparatus includes a susceptor and a showerhead facing the susceptor. The showerhead includes a first plate including an inner tunnel, a first injection hole, and a second injection hole. The inner tunnel extends across the first pate in a thickness direction of the first plate. The first injection hole penetrates a first surface and a second surface of the first plate on opposite sides of the first plate in the thickness direction, The second injection hole penetrates the second surface of the first plate. The second injection is connected with the inner tunnel.

公开(公告)号：US20240420928A1

公开(公告)日：2024-12-19

申请号：US18602334

申请日：2024-03-12

Applicant: Samsung Display Co., Ltd.

Inventor： Eun Chan LIM ,  Hae Young YOO ,  Eun Soo LEE ,  Seon Uk PARK ,  Yong Mun CHANG ,  Hyun Ku PARK ,  Jae Ryong LEE

IPC: H01J37/32

Abstract: A plasma shield assembly may include a guide component including first through holes connected to plasma generators that generate radicals using process gas, and a shield component detachably coupled to the guide component and disposed on a lower surface of the guide component, and including second through holes aligned with the first through holes to pass the radicals from the first through holes. The shield component may be spaced apart from the lower surface of the guide component with a gap formed between the shield component and the guide component. Bumper rings disposed adjacent to the second through holes to prevent the radicals from entering the gap.