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公开(公告)号:US20220005902A1
公开(公告)日:2022-01-06
申请号:US17319580
申请日:2021-05-13
Applicant: Samsung Display Co., Ltd.
Inventor: Seokkyu HAN , Younggil PARK , Jeonghun KWAK , Kihyun KIM , Sungwook WOO , Sunwoo LEE , Huiyeon CHOE
IPC: H01L27/32
Abstract: The display apparatus includes a substrate, a first active layer disposed on the substrate, a first gate layer disposed on a layer covering the first active layer, the first gate layer including a first gate electrode, a second gate layer disposed on a layer covering the first gate layer, the second gate layer including an initialization line including a first part of a second electrode; a second active layer disposed on a layer covering the second gate layer, the second active layer including a second active region overlapping the first part of the second electrode; a third gate layer disposed on a layer covering the second active layer, the third gate layer including a second part of the second electrode overlapping the second active region; and a first source/drain layer disposed on a layer covering the third gate layer, the first source/drain layer including a first connection line.
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公开(公告)号:US20230209900A1
公开(公告)日:2023-06-29
申请号:US18116888
申请日:2023-03-03
Applicant: Samsung Display Co., Ltd.
Inventor: Seokkyu HAN , Younggil PARK , Jeonghun KWAK , Kihyun KIM , Sungwook WOO , Sunwoo LEE , Huiyeon CHOE
IPC: H10K59/121 , H10K59/131
CPC classification number: H10K59/1213 , H10K59/131 , H01L27/1225
Abstract: The display apparatus includes a substrate, a first active layer disposed on the substrate, a first gate layer disposed on a layer covering the first active layer, the first gate layer including a first gate electrode, a second gate layer disposed on a layer covering the first gate layer, the second gate layer including an initialization line including a first part of a second electrode; a second active layer disposed on a layer covering the second gate layer, the second active layer including a second active region overlapping the first part of the second electrode; a third gate layer disposed on a layer covering the second active layer, the third gate layer including a second part of the second electrode overlapping the second active region; and a first source/drain layer disposed on a layer covering the third gate layer, the first source/drain layer including a first connection line.
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公开(公告)号:US20250048837A1
公开(公告)日:2025-02-06
申请号:US18920252
申请日:2024-10-18
Applicant: Samsung Display Co., Ltd.
Inventor: Seokkyu HAN , Younggil PARK , Jeonghun KWAK , Kihyun KIM , Sungwook WOO , Sunwoo LEE , Huiyeon CHOE
IPC: H10K59/121 , H01L27/12 , H01L29/786 , H10K59/131
Abstract: The display apparatus includes a substrate, a first active layer disposed on the substrate, a first gate layer disposed on a layer covering the first active layer, the first gate layer including a first gate electrode, a second gate layer disposed on a layer covering the first gate layer, the second gate layer including an initialization line including a first part of a second electrode; a second active layer disposed on a layer covering the second gate layer, the second active layer including a second active region overlapping the first part of the second electrode; a third gate layer disposed on a layer covering the second active layer, the third gate layer including a second part of the second electrode overlapping the second active region; and a first source/drain layer disposed on a layer covering the third gate layer, the first source/drain layer including a first connection line.
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公开(公告)号:US20180029255A1
公开(公告)日:2018-02-01
申请号:US15661686
申请日:2017-07-27
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Heemin YOO , Yeonjoo SEO , Dahye YOON , Hyunsup YOON , Jungwoon JUNG , Sungchan JO , Kyunglae RHO , Sungwook WOO , Sooim JEONG
IPC: B29C35/08
Abstract: A method of preparing a patterned cured product, the method including: providing a composition including a sol-gel reactive silicon-containing monomer, a polymerizable (meth)acryl monomer, a photoinitiator, and a fluorinating agent on a substrate to form a first layer on the substrate; contacting the first layer with a master mold to form a second layer including a pattern transferred by the master mold; and obtaining the patterned cured product from the second layer, wherein obtaining of the patterned cured product from the second layer includes a sol-gel reaction, a photocuring reaction, and a separating of the master mold.
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