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公开(公告)号:US20220380668A1
公开(公告)日:2022-12-01
申请号:US17826064
申请日:2022-05-26
发明人: Jong Hee PARK , Hyoung Sik KIM , Sang Hyuk LEE , Yong Hoe KIM , Young Kwang KIM , Dong Ho KANG , Hyun-Cheol SHIN , Sung-Tae KIM , Dong Hun LEE , Min Hye LEE , Byung Su LEE , Ki Su JUNG
摘要: An etchant composition includes: an inorganic acid compound at 9.0 wt % to 9.9 wt %; an inorganic salt compound at 5.0 wt % to 10.0 wt %; an organic acid compound at 35 wt % to 45 wt %; a lactate-based compound at 10 wt % to 20 wt %; a nitrogen cyclic compound containing oxygen at 0.1 wt % to 1.0 wt %; and a remaining amount of water such that a total weight of the etchant composition is 100 wt %, wherein the inorganic acid compound is an etchant composition having an acid dissociation constant (pKa) value of −1.0 to −3.0.