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公开(公告)号:US10158074B2
公开(公告)日:2018-12-18
申请号:US15390908
申请日:2016-12-27
Applicant: Samsung Display Co., Ltd.
Inventor: Youngsun Cho , Daeyong Kim , Jongbum Kim , Jongho Yang , Yoonchan Oh
Abstract: An organic layer deposition assembly for depositing a deposition material on a substrate includes a deposition source configured to spray the deposition material, a deposition source nozzle arranged in one side of the deposition source and including deposition source nozzles arranged in a first direction, a patterning slit sheet arranged to face the deposition source nozzle and having patterning slits in a second direction that crosses the first direction, and a correction sheet arranged between the deposition source nozzle and the patterning slit sheet and configured to block at least a part of the deposition material sprayed from the deposition source.
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公开(公告)号:US10385441B2
公开(公告)日:2019-08-20
申请号:US14994906
申请日:2016-01-13
Applicant: Samsung Display Co., Ltd.
Inventor: Yoonchan Oh , Jongho Yang , Youngsun Cho , Jaemin Hong
IPC: C23C14/04 , C23C16/04 , C23C16/458
Abstract: A mask frame assembly and a manufacturing method of the same are provided. The mask frame assembly includes a frame unit having a plurality of frames to form an opening, a deposition mask extended in a first direction and fixed to the frame unit, and a gap adjusting unit installed between one frame and another frame disposed adjacent to the one frame among the plurality of frames, wherein the gap adjusting unit adjusts a distance between the one frame and the another frame.
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公开(公告)号:US20160167083A1
公开(公告)日:2016-06-16
申请号:US14719155
申请日:2015-05-21
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Jeunghoon Kim , Yoonchan Oh , Jangwoo Kim , Heeseak Noh , Bongjun Park , Taeyong An , Daesik Jang , Cheolgyu Jeong , Jaemin Hong
CPC classification number: B05B12/20 , B05C21/005 , C23C14/042 , H01L51/0011 , H01L51/56
Abstract: A mask frame assembly includes a frame and a mask including a pattern portion having a pattern hole and a shape memory alloy portion. A method of manufacturing a mask frame assembly includes forming a pattern portion having a pattern hole and a shape memory alloy portion on a mask, the shape memory alloy portion extending in a first direction at a deposition temperature, and coupling the mask to a frame by extending the mask at a room temperature in a second direction perpendicular to the first direction.
Abstract translation: 荫罩框架组件包括框架和掩模,其包括具有图形孔的图案部分和形状记忆合金部分。 一种掩模框架组件的制造方法包括在掩模上形成具有图案孔和形状记忆合金部分的图案部分,所述形状记忆合金部分在沉积温度下沿第一方向延伸,并将所述掩模与框架相连 在垂直于第一方向的第二方向上在室温下延伸掩模。
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