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公开(公告)号:US20230280276A1
公开(公告)日:2023-09-07
申请号:US18151948
申请日:2023-01-09
Applicant: Samsung Display Co., Ltd. , Nanophoton Korea
Inventor: YONG WOON LIM , Hyo-Jin KIM , Tae Hyun KIM , Hye Kyung SHIN , Kyonghun LEE
CPC classification number: G01N21/65 , G01J3/4412 , G01J3/0216
Abstract: An analysis apparatus includes a laser irradiation unit that irradiates a laser beam, a beam scanner that moves along a pattern to change a position at which the laser beam is irradiated to a sample, a first lens through which a light provided from the sample is transmitted, an optical member to which the light that passes through the first lens is provided and through which a pin hole is defined, and a detection unit that detects a detection light passed through the pin hole.