公开(公告)号：US20230375936A1

公开(公告)日：2023-11-23

申请号：US18153568

申请日：2023-01-12

Applicant: Samsung Electronics Co, Ltd.

Inventor： Sangjin KIM ,  Chansik KIM ,  Geun Su LEE ,  Sungjae JUNG ,  Dokyeong KWON ,  Yigwon KIM ,  Hyunju SONG ,  Hyungju RYU ,  Tae Min CHOI ,  Keon HUH

IPC: G03F7/32 ,  C08F297/02

CPC classification number: G03F7/322 ,  C08F297/02

Abstract: A developing composition and a method of forming a pattern using the same are provided. According to embodiments of inventive concepts, the developing composition may include at least one repeating unit selected from a first repeating unit represented by Chemical Formula A1 a second repeating unit represented by Chemical Formula A2, or both the first repeating unit represented by Chemical Formula A1 and second repeating unit represented by Chemical Formula A2. The developing composition may further include a copolymer including a third repeating unit represented by Chemical Formula A3.