公开(公告)号：US20170133199A1

公开(公告)日：2017-05-11

申请号：US15252828

申请日：2016-08-31

Applicant: Samsung Electronics Co., Ltd.

Inventor： SUYOUNG LEE ,  TAMAMUSHI SHUICHI ,  BYUNGGOOK KIM ,  BYOUNGSUP AHN

IPC: H01J37/302 ,  H01J37/24 ,  G03F7/20 ,  H01J37/04

CPC classification number: H01J37/302 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0437

Abstract: A system includes an aperture array comprising a plurality of active apertures, respective ones of the active apertures configured to selectively deflect beams passing therethrough. The system also includes a limiting aperture configured to pass beams not deflected by the active apertures to a target object. The system further includes a control circuit configured to control the active apertures to provide first and second different exposure duration resolutions.