公开(公告)号：US20240162039A1

公开(公告)日：2024-05-16

申请号：US18483176

申请日：2023-10-09

Applicant: Samsung Electronics Co., Ltd.

Inventor： Bon Hyun GU ,  Soo Yong LEE ,  Bong Cheol KIM ,  Sang Ho LEE

IPC: H01L21/027 ,  H01L21/56 ,  H01L21/66

CPC classification number: H01L21/0274 ,  H01L21/565 ,  H01L22/12

Abstract: Provided is a method for manufacturing a photomask. The method comprises providing a pre-photomask, the pre-photomask including a first area, a second area configured to perform a first duty correction, and a third area configured to perform a second duty correction; forming a pre-photoresist pattern using the pre-photomask such that the pre-photoresist pattern has a stepped shape having at least three steps in a cross-sectional view of the pre-photoresist pattern; analyzing a profile of the pre-photoresist pattern in the cross-sectional view; and inserting an auxiliary pattern into at least one of the first to third areas, based on a result of the analyzing of the profile of the pre-photoresist pattern.