公开(公告)号：US20190180972A1

公开(公告)日：2019-06-13

申请号：US16003870

申请日：2018-06-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyun Ho LEE ,  Jong Mun PARK ,  Byoung Sup AHN ,  Jin CHOI ,  Shuichi TAMAMUSHI

IPC: H01J37/09 ,  H01J37/10

Abstract: An aperture system of an electron beam apparatus includes a plurality of apertures each including a first area including at least one through hole allowing an electron beam to pass therethrough and a second area disposed outside the first area and including first and second alignment keys, wherein two apertures, among the plurality of apertures, include the first alignment keys arranged in mutually overlapping positions and having the same size, and an aperture, excluding the two apertures, among the plurality of apertures, includes the second alignment keys arranged to overlap the first alignment keys and having an area larger than an area of the first alignment keys.