公开(公告)号：US20160357117A1

公开(公告)日：2016-12-08

申请号：US15135561

申请日：2016-04-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： SUNGJOO KIM ,  YUN KYEONG JANG ,  JINHONG PARK ,  DOHYUN SEO ,  HyunHoon LEE

IPC: G03F7/20 ,  G03F7/32 ,  G03F7/16

CPC classification number: G03F7/70925

Abstract: An exposure apparatus and manufacturing methods using the exposure apparatus are disclosed. An exposure apparatus includes a light source system generating light, an optical system controlling and patterning the light, a substrate system on which an exposure process is performed on a substrate by the patterned light, and a control unit controlling the light source system, the optical system and the substrate system. The optical system includes a chamber, a reflection member disposed in the chamber to control the light, and a first on-off valve installed on one side of the chamber opposite to the substrate system. The control unit controls the optical system such that the first on-off valve is opened during the exposure process and is closed during a cleaning process performed to the inside of the chamber.

Abstract translation: 公开了使用曝光装置的曝光装置和制造方法。 曝光装置包括产生光的光源系统，控制和图案化光的光学系统，通过图案化光对衬底进行曝光处理的衬底系统以及控制光源系统的控制单元，光学系统 系统和基板系统。 该光学系统包括一个室，设置在该腔室中以控制该光的反射构件以及安装在该腔室的与衬底系统相对的一侧上的第一开关阀。 所述控制单元控制所述光学系统，使得所述第一开关阀在所述曝光过程期间被打开，并且在对所述室的内部进行的清洁处理期间被关闭。