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公开(公告)号：US20240095113A1
公开(公告)日：2024-03-21
申请号：US18232442
申请日：2023-08-10
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： TAESUN KIM , JINHONG PARK , HWISOO SO , KYOUNGWOO LEE , JINHYO JUNG
CPC classification number: G06F11/0751 , G06F9/3867
Abstract: A processor includes an instruction pipeline that sequentially processes an original instruction and a duplicate instruction, which is generated by duplicating the original instruction. An original register file stores a result obtained by processing the original instruction in the instruction pipeline within a register of a nth index thereof. A duplicate register file stores a result obtained by processing the duplicate instruction in the instruction pipeline within a register of a nth index thereof. A comparing unit compares the register of the nth index in the original register file with the register of nth index in the duplicate register file and outputs an error detection signal, in response to a control signal.
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公开(公告)号：US20160357117A1
公开(公告)日：2016-12-08
申请号：US15135561
申请日：2016-04-22
Applicant: Samsung Electronics Co., Ltd.
Inventor： SUNGJOO KIM , YUN KYEONG JANG , JINHONG PARK , DOHYUN SEO , HyunHoon LEE
CPC classification number: G03F7/70925
Abstract: An exposure apparatus and manufacturing methods using the exposure apparatus are disclosed. An exposure apparatus includes a light source system generating light, an optical system controlling and patterning the light, a substrate system on which an exposure process is performed on a substrate by the patterned light, and a control unit controlling the light source system, the optical system and the substrate system. The optical system includes a chamber, a reflection member disposed in the chamber to control the light, and a first on-off valve installed on one side of the chamber opposite to the substrate system. The control unit controls the optical system such that the first on-off valve is opened during the exposure process and is closed during a cleaning process performed to the inside of the chamber.
Abstract translation: 公开了使用曝光装置的曝光装置和制造方法。 曝光装置包括产生光的光源系统，控制和图案化光的光学系统，通过图案化光对衬底进行曝光处理的衬底系统以及控制光源系统的控制单元，光学系统 系统和基板系统。 该光学系统包括一个室，设置在该腔室中以控制该光的反射构件以及安装在该腔室的与衬底系统相对的一侧上的第一开关阀。 所述控制单元控制所述光学系统，使得所述第一开关阀在所述曝光过程期间被打开，并且在对所述室的内部进行的清洁处理期间被关闭。
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公开(公告)号：US20250102926A1
公开(公告)日：2025-03-27
申请号：US18618345
申请日：2024-03-27
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sanghwan LEE , DOHYUNG KIM , JINHONG PARK , Sungbin JEON
IPC: G03F7/00
Abstract: Disclosed are a reticle masking device, a substrate processing apparatus, and a substrate processing method. The reticle masking device comprises a first masking device that provides a mask hole, a second masking device that is movable in a first direction with respect to the first masking device, and an optical sensor device coupled to the second masking device. The second masking device provides a slit vertically penetrates the second masking device and that overlaps the mask hole. The optical sensor device includes a first sensor fixedly coupled to a bottom surface of the second masking device, and a second sensor that stands opposite to the first sensor across the slit and is fixedly coupled to the bottom surface of the second masking device.
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