公开(公告)号：US20250044706A1

公开(公告)日：2025-02-06

申请号：US18674355

申请日：2024-05-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ji Young PARK ,  Daekeon KIM ,  Seungyeol BAEK ,  Giyoung SONG ,  Hyun-Ji SONG ,  Thanh Cuong NGUYEN ,  Suk Koo HONG

IPC: G03F7/00

Abstract: In a method of predicting extreme ultraviolet (EUV) dose, an entire photochemical reaction mechanism until a photoacid generator (PAG) molecule releases a proton from a PAG-cation under EUV exposure may be analyzed. A lowest unoccupied molecular orbital (LUMO) energy level may be obtained by performing a simulation for structural optimization of the PAG-cation. An additional parameter different from the LUMO energy level may be obtained by performing a simulation for structural optimization of at least one intermediate molecular structure formed by the entire photochemical reaction mechanism. A two-parameter linear regression model for predicting the EUV dose may be obtained based on the LUMO energy level and the additional parameter.