公开(公告)号：US20250044706A1

公开(公告)日：2025-02-06

申请号：US18674355

申请日：2024-05-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ji Young PARK ,  Daekeon KIM ,  Seungyeol BAEK ,  Giyoung SONG ,  Hyun-Ji SONG ,  Thanh Cuong NGUYEN ,  Suk Koo HONG

IPC: G03F7/00

Abstract: In a method of predicting extreme ultraviolet (EUV) dose, an entire photochemical reaction mechanism until a photoacid generator (PAG) molecule releases a proton from a PAG-cation under EUV exposure may be analyzed. A lowest unoccupied molecular orbital (LUMO) energy level may be obtained by performing a simulation for structural optimization of the PAG-cation. An additional parameter different from the LUMO energy level may be obtained by performing a simulation for structural optimization of at least one intermediate molecular structure formed by the entire photochemical reaction mechanism. A two-parameter linear regression model for predicting the EUV dose may be obtained based on the LUMO energy level and the additional parameter.

公开(公告)号：US20240255848A1

公开(公告)日：2024-08-01

申请号：US18449156

申请日：2023-08-14

Applicant: Geun Su Lee ,  Samsung Electronics Co., Ltd.

Inventor： Chawon KOH ,  Yeon Hee SEONG ,  Tsunehiro NISHI ,  Geun Su LEE ,  Sung Jae JUNG ,  Moo Hyun KOH ,  Ji Young PARK ,  Seungyeol BAEK

IPC: G03F7/004 ,  C07F7/22 ,  C07F9/6596 ,  G03F7/075 ,  G03F7/16 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/0045 ,  C07F7/2224 ,  C07F9/6596 ,  G03F7/0757 ,  G03F7/168 ,  G03F7/38 ,  H01L21/0274

Abstract: The present disclosure relates to a semiconductor photoresist composition including an organometallic compound represented by Chemical Formula 1 and a solvent, and a method of forming patterns by using the semiconductor photoresist composition.

公开(公告)号：US20240142874A1

公开(公告)日：2024-05-02

申请号：US18381678

申请日：2023-10-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Chawon KOH ,  Jiyoung PARK ,  Seungyeol BAEK ,  Tsunehiro NISHI ,  Jinkyu HAN

IPC: G03F7/039 ,  G03F7/004

CPC classification number: G03F7/039 ,  G03F7/0045

Abstract: A non-chemically amplified resist composition includes a photo-decomposable organic resin including a C—O bond in a main chain thereof; an acidic chain scission enhancer; and a solvent.

公开(公告)号：US20220293880A1

公开(公告)日：2022-09-15

申请号：US17686293

申请日：2022-03-03

Applicant: Samsung Electronics Co., Ltd. ,  Korea Advanced Institute of Science and Technology

Inventor： Kyuyoung HWANG ,  Muhyun BAIK ,  Seungyeon KWAK ,  Won-joon SON ,  Hyeonho CHOI ,  Seoungtae KIM ,  Seungyeol BAEK ,  Jinhoon JEONG ,  Sunghan KIM ,  Byoungki CHOI

IPC: H01L51/50 ,  H01L51/56

Abstract: Provided are a light-emitting device, a method of manufacturing the light-emitting device, and an operating method of the light-emitting device, wherein the light-emitting device includes a first conductive layer and a light-emitting group represented by Formula 1: *-A3-(A1)m1-(A2)m2.  Formula 1 The detailed description of Formula 1 is the same as described in the present specification.