公开(公告)号：US12185253B2

公开(公告)日：2024-12-31

申请号：US17743883

申请日：2022-05-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Byunggil Jeon ,  Jongbok Jang ,  Eunsik Jang

IPC: H04W52/06 ,  H04B1/04 ,  H04B17/10 ,  H04B17/13

Abstract: A method and electronic device are provided for adjusting an output power of an RF signal to be output to an antenna, based on a proximity of an object and a shape (or configuration) of the electronic device. The electronic device may include a proximity sensor, an antenna corresponding to the proximity sensor, a power amplifier corresponding to the antenna, and a processor configured to control the power amplifier to output a first RF signal having a first output power to the antenna, identify the antenna corresponding to the proximity sensor, based on proximity of an object being detected by the proximity sensor, identify, using a power table configured for the antenna, a second output power corresponding to a shape of the electronic device and the proximity of the object being detected, wherein the second output power is different from the first output power, and control the power amplifier to output a second RF signal having the second output power, to the antenna.

公开(公告)号：US11467484B2

公开(公告)日：2022-10-11

申请号：US16800316

申请日：2020-02-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seulgi Kim ,  Hyonseok Song ,  Inyong Kang ,  Kangwon Lee ,  JuHyoung Lee ,  Eunsik Jang

IPC: G03F1/22 ,  G03F7/20 ,  H01L21/66 ,  H01L21/027 ,  G01N21/956

Abstract: A method for inspecting a reticle including a reflective layer on a reticle substrate is provided. The method may include loading the reticle on a stage, cooling the reticle substrate to a temperature lower than a room temperature, irradiating a laser beam to the reflective layer on the reticle substrate, receiving the laser beam using a photodetector to obtain an image of the reflective layer, and detect a particle defect on the reflective layer or a void defect in the reflective layer based on the image of the reflective layer.

公开(公告)号：US11726398B2

公开(公告)日：2023-08-15

申请号：US17874783

申请日：2022-07-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seulgi Kim ,  Hyonseok Song ,  Inyong Kang ,  Kangwon Lee ,  JuHyoung Lee ,  Eunsik Jang

IPC: G03F1/22 ,  G03F7/20 ,  H01L21/66 ,  H01L21/027 ,  G01N21/956

CPC classification number: G03F1/22 ,  G03F7/2004 ,  H01L21/0274 ,  H01L22/12 ,  G01N2021/95676

Abstract: A method for inspecting a reticle including a reflective layer on a reticle substrate is provided. The method may include loading the reticle on a stage, cooling the reticle substrate to a temperature lower than a room temperature, irradiating a laser beam to the reflective layer on the reticle substrate, receiving the laser beam using a photodetector to obtain an image of the reflective layer, and detect a particle defect on the reflective layer or a void defect in the reflective layer based on the image of the reflective layer.