公开(公告)号：US20200341364A1

公开(公告)日：2020-10-29

申请号：US16598180

申请日：2019-10-10

Applicant: Samsung Electronics Co., Ltd. ,  Research & Business Foundation SUNGKYUNKWAN UNIVERSITY

Inventor： Mun Ja KIM ,  Seulgi Kim ,  Kibong NAM ,  Jinho YEO ,  Jibeom YOO

IPC: G03F1/64

Abstract: Methods of manufacturing a pellicle assembly may include forming a sublimable support layer on a first surface of a pellicle membrane, attaching a pellicle frame to a second surface of the pellicle membrane while the sublimable support layer is on the first surface of the pellicle membrane, and sublimating the sublimable support layer while the pellicle frame is attached to the pellicle membrane. In order to manufacture a photomask assembly, a photomask is fixed to the pellicle frame such that the photomask faces the pellicle membrane with the pellicle frame therebetween.

公开(公告)号：US11726398B2

公开(公告)日：2023-08-15

申请号：US17874783

申请日：2022-07-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seulgi Kim ,  Hyonseok Song ,  Inyong Kang ,  Kangwon Lee ,  JuHyoung Lee ,  Eunsik Jang

IPC: G03F1/22 ,  G03F7/20 ,  H01L21/66 ,  H01L21/027 ,  G01N21/956

CPC classification number: G03F1/22 ,  G03F7/2004 ,  H01L21/0274 ,  H01L22/12 ,  G01N2021/95676

Abstract: A method for inspecting a reticle including a reflective layer on a reticle substrate is provided. The method may include loading the reticle on a stage, cooling the reticle substrate to a temperature lower than a room temperature, irradiating a laser beam to the reflective layer on the reticle substrate, receiving the laser beam using a photodetector to obtain an image of the reflective layer, and detect a particle defect on the reflective layer or a void defect in the reflective layer based on the image of the reflective layer.

公开(公告)号：US11467484B2

公开(公告)日：2022-10-11

申请号：US16800316

申请日：2020-02-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seulgi Kim ,  Hyonseok Song ,  Inyong Kang ,  Kangwon Lee ,  JuHyoung Lee ,  Eunsik Jang

IPC: G03F1/22 ,  G03F7/20 ,  H01L21/66 ,  H01L21/027 ,  G01N21/956

Abstract: A method for inspecting a reticle including a reflective layer on a reticle substrate is provided. The method may include loading the reticle on a stage, cooling the reticle substrate to a temperature lower than a room temperature, irradiating a laser beam to the reflective layer on the reticle substrate, receiving the laser beam using a photodetector to obtain an image of the reflective layer, and detect a particle defect on the reflective layer or a void defect in the reflective layer based on the image of the reflective layer.

公开(公告)号：US11073757B2

公开(公告)日：2021-07-27

申请号：US16598180

申请日：2019-10-10

Applicant: Samsung Electronics Co., Ltd. ,  Research & Business Foundation SUNGKYUNKWAN UNIVERSITY

Inventor： Mun Ja Kim ,  Seulgi Kim ,  Kibong Nam ,  Jinho Yeo ,  Jibeom Yoo

IPC: G03F1/64 ,  G03F1/62

Abstract: Methods of manufacturing a pellicle assembly may include forming a sublimable support layer on a first surface of a pellicle membrane, attaching a pellicle frame to a second surface of the pellicle membrane while the sublimable support layer is on the first surface of the pellicle membrane, and sublimating the sublimable support layer while the pellicle frame is attached to the pellicle membrane. In order to manufacture a photomask assembly, a photomask is fixed to the pellicle frame such that the photomask faces the pellicle membrane with the pellicle frame therebetween.