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1.发明授权公开(公告)号：US11061322B2
公开(公告)日：2021-07-13
申请号：US16114880
申请日：2018-08-28
Applicant: Samsung Electronics Co., Ltd.
Inventor： Ji Hoon Na , Dong Gun Lee , Hee Bom Kim
Abstract: A system includes a plate configured for mounting of a reflective extreme ultra-violet (EUV) mask thereon and a zone plate configured to divide EUV light into zero-order light and first-order light and to pass the zero-order light and the first-order light to the reflective EUV mask. The system further includes a detector configured to receive EUV light reflected by the EUV mask and including a zero-order light detection region configured to generate a first image signal and a first-order light detection region configured to generate a second image signal, and a calculator configured to generate a compensated third image signal from the first image signal and the second image signal. The third image signal may be used to determine a distance between mask patterns of the EUV mask.
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2.发明授权公开(公告)号：US11281093B2
公开(公告)日：2022-03-22
申请号：US17342611
申请日：2021-06-09
Applicant: Samsung Electronics Co., Ltd.
Inventor： Ji Hoon Na , Dong Gun Lee , Hee Bom Kim
Abstract: A system includes a plate configured for mounting of a reflective extreme ultra-violet (EUV) mask thereon and a zone plate configured to divide EUV light into zero-order light and first-order light and to pass the zero-order light and the first-order light to the reflective EUV mask. The system further includes a detector configured to receive EUV light reflected by the EUV mask and including a zero-order light detection region configured to generate a first image signal and a first-order light detection region configured to generate a second image signal, and a calculator configured to generate a compensated third image signal from the first image signal and the second image signal. The third image signal may be used to determine a distance between mask patterns of the EUV mask.
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3.发明申请公开(公告)号：US20190235387A1
公开(公告)日：2019-08-01
申请号：US16114880
申请日：2018-08-28
Applicant: Samsung Electronics Co., Ltd.
Inventor： Ji Hoon Na , Dong Gun Lee , Hee Bom Kim
CPC classification number: G03F7/2004 , G03F1/22 , G03F7/2008 , G03F7/70491
Abstract: A system includes a plate configured for mounting of a reflective extreme ultra-violet (EUV) mask thereon and a zone plate configured to divide EUV light into zero-order light and first-order light and to pass the zero-order light and the first-order light to the reflective EUV mask. The system further includes a detector configured to receive EUV light reflected by the EUV mask and including a zero-order light detection region configured to generate a first image signal and a first-order light detection region configured to generate a second image signal, and a calculator configured to generate a compensated third image signal from the first image signal and the second image signal. The third image signal may be used to determine a distance between mask patterns of the EUV mask.
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4.发明申请公开(公告)号：US20210302828A1
公开(公告)日：2021-09-30
申请号：US17342611
申请日：2021-06-09
Applicant: Samsung Electronics Co., Ltd.
Inventor： Ji Hoon Na , Dong Gun Lee , Hee Bom Kim
Abstract: A system includes a plate configured for mounting of a reflective extreme ultra-violet (EUV) mask thereon and a zone plate configured to divide EUV light into zero-order light and first-order light and to pass the zero-order light and the first-order light to the reflective EUV mask. The system further includes a detector configured to receive EUV light reflected by the EUV mask and including a zero-order light detection region configured to generate a first image signal and a first-order light detection region configured to generate a second image signal, and a calculator configured to generate a compensated third image signal from the first image signal and the second image signal. The third image signal may be used to determine a distance between mask patterns of the EUV mask.
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