公开(公告)号：US10747104B2

公开(公告)日：2020-08-18

申请号：US15690879

申请日：2017-08-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Mun-Ja Kim ,  Ji-Beom Yoo ,  Soo-Young Kim ,  Hee-Bom Kim ,  Hwan-Chul Jeon ,  Seul-Gi Kim ,  Tae-Sung Kim ,  Dong-Wook Shin

IPC: G03F1/64

Abstract: A method of manufacturing a pellicle includes preparing a pellicle frame having an adhesive layer coated thereon, treating a pellicle membrane with vapor under vapor atmosphere, attaching the pellicle membrane onto the pellicle frame, and drying the pellicle membrane.

公开(公告)号：US11067887B2

公开(公告)日：2021-07-20

申请号：US16918106

申请日：2020-07-01

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Mun-Ja Kim ,  Ji-Beom Yoo ,  Soo-Young Kim ,  Hee-Bom Kim ,  Hwan-Chul Jeon ,  Seul-Gi Kim ,  Tae-Sung Kim ,  Dong-Wook Shin

IPC: G03F1/64

Abstract: A method of manufacturing a pellicle includes preparing a pellicle frame having an adhesive layer coated thereon, treating a pellicle membrane with vapor under vapor atmosphere, attaching the pellicle membrane onto the pellicle frame, and drying the pellicle membrane.

公开(公告)号：US20170038676A1

公开(公告)日：2017-02-09

申请号：US15155444

申请日：2016-05-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yong-seok JUNG ,  Hwan-Chul Jeon ,  Byung-gook Kim ,  Jae-hyuck Choi ,  Sung-won Kwon

IPC: G03F1/64

CPC classification number: G03F1/64 ,  G03F1/62

Abstract: A pellicle includes a pellicle membrane, which includes a porous thin film. The porous thin film includes a plurality of nanowires, which are arranged across one another to form a net structure. A photomask assembly includes the pellicle and a photomask, wherein the pellicle is fixed to a surface of the photomask.

Abstract translation: 防护薄膜组件包括防护薄膜，其包括多孔薄膜。 多孔薄膜包括多个纳米线，它们彼此排列以形成网状结构。 光掩模组件包括防护薄膜组件和光掩模，其中防护薄膜组件固定到光掩模的表面。