公开(公告)号：US20250052691A1

公开(公告)日：2025-02-13

申请号：US18394784

申请日：2023-12-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Youngsun CHOI ,  Soonyang KWON ,  Kwangrak KIM ,  Jangryul PARK ,  Jiwoong KIM ,  Youngjun LEE

IPC: G01N21/956 ,  G01J3/02 ,  G01J3/06 ,  G01J3/45 ,  H01L21/66

Abstract: A method of manufacturing a semiconductor device using a semiconductor measurement apparatus includes extracting an interference pattern using a microsphere, and measuring a distance between a specimen and the microsphere, based on the interference pattern. A semiconductor measurement apparatus includes a light source configured to output at least one light, a scanner having a microsphere-objective lens, the scanner configured to allow the at least one light to be incident on a specimen, a spectrometer configured to obtain a spectrum of light reflected from the specimen; and a distance measurement apparatus configured to calculate a microsphere-to-specimen distance by analyzing a change in the spectrum.