公开(公告)号：US20140264089A1

公开(公告)日：2014-09-18

申请号：US14097644

申请日：2013-12-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： In-Sung Kim ,  Ho-Yeon Kim ,  Ho-Chul Kim ,  Seung-Koo Lee ,  Jin-Ho Jeon

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H01S3/2232 ,  H01S3/2316

Abstract: An apparatus and method for generating extreme ultra violet EUV radiation includes a light source providing light to a laser medium to generate a first laser, a droplet generator to provide a droplet to reflect the first laser to one end of the laser medium, a laser generator positioned at the opposite end of the laser medium from that of the droplet and a second laser to expand the droplet or not and to thereby control the conversion efficiency and dose of the EUV generation apparatus.

Abstract translation: 用于产生极端紫外EUV辐射的装置和方法包括：向激光介质提供光以产生第一激光的光源;液滴发生器，用于提供液滴以将第一激光反射到激光介质的一端;激光发生器 位于激光介质的另一端和液滴的另一端，第二激光器不扩散液滴，从而控制EUV产生装置的转换效率和剂量。