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公开(公告)号：US20240275114A1
公开(公告)日：2024-08-15
申请号：US18568515
申请日：2022-05-16
CPC分类号： H01S3/0064 , G02F1/11 , G03F7/70033 , G03F7/70891 , H01S3/0405 , G02F2203/21 , H01S3/2232 , H05G2/005 , H05G2/008
摘要： The present invention relates to an optical isolator for a seed laser, comprising: an acousto-optic modulator crystal configured to manipulate laser light incident thereto, and at least one cooling system configured to regulate a temperature of the crystal, said cooling system comprising: a cooling element including one or more channels for a fluidic cooling medium, a heat transfer assembly arranged between the crystal and the cooling element to transfer heat from the crystal to the cooling element, wherein the heat transfer assembly includes an active heat transfer element.
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公开(公告)号：US11828952B2
公开(公告)日：2023-11-28
申请号：US17218891
申请日：2021-03-31
发明人： Dohyung Kim , Seongchul Hong , Kyungsik Kang , Kyungbin Park , Motoshi Sakai , Seungkoo Lee , Jungchul Lee
CPC分类号： G02B27/1073 , G02B27/106 , G02B27/108 , G02B27/141 , G03F7/70191 , H01S3/0071 , H01S3/2308 , H01S3/2383 , H05G2/008 , H01S3/2232
摘要： A light source capable of operating third and fourth reflection mirrors included in a beam splitting device in conjunction with movements of first and second reflection mirrors included in a beam transfer device and an optical assembly, respectively. The third and fourth reflection mirrors are disposed on optical paths of a pre-pulse and a main pulse emitted from first and second pulse generators, respectively. The light source operates the third and fourth reflection mirrors to offset an excessive compensation of the main pulse caused in a process of compensating for an optical path error of the pre-pulse. The light source may be included in an extreme ultraviolet light source system.
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公开(公告)号：US20230378714A1
公开(公告)日：2023-11-23
申请号：US18257689
申请日：2021-12-20
发明人： Daniel J Ryan , Ryan R Ahern
CPC分类号： H01S3/2232 , H01S3/115 , H01S3/08059 , H01S3/105
摘要： A CO2 laser configured to produce infrared electromagnetic radiation comprising an optical element comprising a frequency selective structure having a substantially periodic pattern of features. A frequency response of the optical element is configured to change upon receipt of a signal. A Q-factor of the CO2 laser changes upon receipt of the signal. A laser marking system may incorporate the CO2 laser.
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公开(公告)号：US11764538B2
公开(公告)日：2023-09-19
申请号：US17478975
申请日：2021-09-20
发明人： Jonathan Mueller
CPC分类号： H01S3/10015 , H01S3/005 , H01S3/0071 , H01S3/106 , H01S3/10023 , H01S3/16 , H01S3/225 , H01S3/2232
摘要： A method for adjusting a laser beam includes, following passage of the laser beam through a beam-shaping device, measuring, via a detector of a detector device, a beam profile of the laser beam. The method further includes determining a beam quality property of the laser beam based on the measured beam profile and altering an adjustable optical unit for modifying at least one property of the laser beam prior to the entry into the beam-shaping device. For adjusting the laser beam, the adjustable optical unit is altered based on the determined beam quality property.
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公开(公告)号：US20180351322A1
公开(公告)日：2018-12-06
申请号：US16055656
申请日：2018-08-06
申请人： GIGAPHOTON INC.
CPC分类号： H01S3/134 , G01N21/5907 , G01N33/004 , G01N33/0063 , G03F7/70033 , H01S3/005 , H01S3/0071 , H01S3/034 , H01S3/036 , H01S3/1305 , H01S3/1306 , H01S3/2232 , H01S3/2316
摘要： A laser apparatus according to one aspect of the present disclosure includes a master oscillator configured to output laser light, a plurality of amplifiers each configured to include carbon dioxide as a laser medium and amplify the laser light, a first optical path pipe configured to cover a laser optical path between the amplifiers, a gas supply port configured to supply, into the first optical path pipe, gas having lower carbon dioxide concentration than that of the air, a first carbon dioxide densitometer configured to measure carbon dioxide concentration in the first optical path pipe, and an alarm device configured to issue an alarm when the carbon dioxide concentration measured by the first carbon dioxide densitometer exceeds a preset prescribed value.
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公开(公告)号：US20180254598A1
公开(公告)日：2018-09-06
申请号：US14586714
申请日：2014-12-30
发明人： Bihe Deng
CPC分类号： H01S3/094003 , H01S3/0315 , H01S3/08068 , H01S3/2232
摘要： A new optically pumped far infrared (FIR) laser with separate pump beam reflector and FIR output coupler is developed. The configuration of the new FIR laser greatly simplifies the tuning of the laser and enables the optimization of the pump beam absorption without affecting the laser alignment.
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7.发明申请公开(公告)号：US20180246250A1
公开(公告)日：2018-08-30
申请号：US15558953
申请日：2016-12-21
发明人： Juan NAVARRO SORROCHE , Weijun GUO
CPC分类号： G01V5/125 , E21B47/1015 , G21K1/08 , H01S3/0405 , H01S3/041 , H01S3/042 , H01S3/11 , H01S3/13 , H01S3/1625 , H01S3/1636 , H01S3/2232
摘要： The disclosed embodiments include downhole gamma-ray generators and methods to utilize downhole gamma-ray generators in a downhole environment. In one embodiment, a downhole gamma-ray generator includes a target foil formed from a first material. The downhole gamma-ray generator also includes a second layer deposited along a back surface of the target foil. The downhole gamma-ray generator further includes a laser system operable to direct optical pulses onto a front surface of the target foil to ionize atoms of the first material, where electrons produced by ionization of the first material propagate through the target foil and decelerates when the electrons interact with the high density material, and where the deceleration of the electrons produces gamma-rays that are utilized to obtain one or more formation properties of a downhole formation.
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公开(公告)号：US20180110116A1
公开(公告)日：2018-04-19
申请号：US15832476
申请日：2017-12-05
申请人： Gigaphoton Inc.
IPC分类号： H05G2/00 , H01S3/00 , H01S3/23 , H01S3/223 , H01S3/16 , H01S3/11 , H01S3/104 , H01S3/09 , H01S3/102
CPC分类号： H05G2/008 , H01S3/005 , H01S3/0071 , H01S3/09 , H01S3/102 , H01S3/104 , H01S3/1106 , H01S3/1611 , H01S3/1643 , H01S3/1673 , H01S3/2232 , H01S3/2308 , H01S3/2366 , H01S3/2391 , H05G2/003 , H05G2/005
摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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公开(公告)号：US20180034228A1
公开(公告)日：2018-02-01
申请号：US15552730
申请日：2016-04-20
发明人： Kouji FUNAOKA , Masashi NARUSE
CPC分类号： H01S3/03 , H01S3/0071 , H01S3/02 , H01S3/034 , H01S3/041 , H01S3/2232 , H01S3/2366 , H05G2/008
摘要： Kinematic mounts have three points having zero degree of freedom, one degree of freedom, and two degrees of freedom, respectively. As viewed from a direction perpendicular to a plane containing the three points, an extension of an entrance optical axis of a laser beam to an amplifying apparatus or an extension of an exit optical axis from the amplifying apparatus is oriented to the point with the zero degree of freedom. A translational direction of the point with the one degree of freedom is oriented to the point with the zero degree of freedom. One of the extension of the entrance optical axis and the extension of the exist optical axis passes on a side closer to the point with the two degrees of freedom with respect to a side of the point with the one degree of freedom.
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公开(公告)号：US09680277B2
公开(公告)日：2017-06-13
申请号：US14657640
申请日：2015-03-13
申请人： Gigaphoton Inc.
IPC分类号： H01S3/034 , H01S3/07 , H01S3/09 , H01S3/23 , H01S3/223 , H01S3/22 , H01S3/0971 , H01S3/03 , H05G2/00
CPC分类号： H01S3/034 , H01S3/03 , H01S3/076 , H01S3/0971 , H01S3/2232 , H01S3/2316 , H01S3/2325 , H01S3/2366 , H01S3/2375 , H01S2301/02 , H05G2/008
摘要： There is provided a slab amplifier including an optical system (48, 51) provided in a chamber (47) to allow a seed beam having entered from a first window into the space between a pair of electrodes (42, 43) to be repeatedly reflected between the space so that the seed beam is amplified to be an amplified beam; a first aperture plate (61) provided between the first window and the electrodes, and having an opening of a dimension equal to or greater than a cross-section of the seed beam and equal to or smaller than a dimension of the first window; and a second aperture plate (62) provided between the second window and the electrodes, and having an opening of a dimension equal to or greater than a cross-section of the amplified beam and equal to or smaller than a dimension of the second window.
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