公开(公告)号：US20160372386A1

公开(公告)日：2016-12-22

申请号：US15142275

申请日：2016-04-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kiwook SONG ,  Bum-Soo KIM ,  Kye Hyun BAEK ,  MASAYUKI TOMOYASU ,  Eunwoo LEE ,  JONG SEO HONG

IPC: H01L21/66 ,  B08B9/46 ,  G01N21/73 ,  B08B9/08

CPC classification number: H01L22/10 ,  G05B19/41875 ,  G05B2219/32234 ,  G05B2219/45031 ,  H01J37/3288 ,  H01J37/32972

Abstract: Provided are substrate processing systems and methods of managing the same. The method may include displaying a notification for a preventive maintenance operation on a chamber, performing a maintenance operation on the chamber, performing a first optical test, and evaluating the preventive maintenance operation. The first optical test may include generating a reference plasma reaction, measuring a variation of intensity by wavelength for plasma light emitted from the reference plasma reaction, and calculating an electron density and an electron temperature from a ratio in intensity of the plasma light.

Abstract translation: 提供了基板处理系统及其管理方法。 该方法可以包括在室上显示用于预防性维护操作的通知，在腔室上执行维护操作，执行第一光学测试以及评估预防性维护操作。 第一光学测试可以包括产生参考等离子体反应，测量从参考等离子体反应发射的等离子体光的波长的强度变化，以及根据等离子体光的强度的比率计算电子密度和电子温度。