专利检索 ap:("Samsung Electronics Co., Ltd.") AND inv:"Kwang-hyun YANG" 第 1 页

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发明申请
METHOD OF INSPECTING SEMICONDUCTOR SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 审中-公开

公开(公告)号：US20190096773A1

公开(公告)日：2019-03-28

申请号：US15887186

申请日：2018-02-02

申请人： Samsung Electronics Co., Ltd.

发明人： Yeon-tae KIM , Do-hyung KIM , Kwang-hyun YANG , Chang-yun LEE , Young-uk CHOI , Kee-soo PARK , Eun-sok CHOI

IPC分类号： H01L21/66 , H01L21/687 , H01L21/67

摘要： A method of inspecting a semiconductor substrate includes measuring light intensity of light reflected on the rotating semiconductor substrate, analyzing a frequency distribution of the measured light intensity, and determining a state of the semiconductor substrate by using the frequency distribution. The analyzing of the frequency distribution of the measured light intensity includes extracting a plurality of frequency components corresponding respectively to a plurality of frequencies from the measured light intensity.