公开(公告)号：US20190179225A1

公开(公告)日：2019-06-13

申请号：US16016779

申请日：2018-06-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hwan Seok SEO ,  Myoung Soo LEE ,  Byung Hoon LEE

IPC: G03F1/22 ,  G03F1/54 ,  G03F1/52 ,  G03F1/42

Abstract: A photomask is provided. The photomask comprises: a low thermal expansion material (LTEM) substrate including a first surface and a second surface; a reflective layer disposed on the first surface of the low thermal expansion material substrate and including first material layers and second material layers, which are stacked alternately; a light absorbing pattern on the reflective layer; and a conductive layer on the second surface of the low thermal expansion material substrate, wherein the low thermal expansion material substrate includes a correction defect correcting the light absorbing pattern, and the conductive layer is one of ruthenium oxide (RuO2), iridium oxide (IrO2), and/or a combination thereof.