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公开(公告)号:US11605567B2
公开(公告)日:2023-03-14
申请号:US17212914
申请日:2021-03-25
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jitae Park , Youngjoo Lee , Taekyun Kang , Doo Young Gwak , Aekyung Kim , Hyowon Bae , Kyunggon You , Seongjin In , Sang Yoon Han
Abstract: Disclosed are a method of monitoring a semiconductor device fabrication process and a method of fabricating a semiconductor device using the same. The monitoring method may include determining a normalization range of a target byproduct, which is a measurement target of byproducts produced in a chamber by an etching process, the byproducts including the target byproduct and a non-target byproduct, the target byproduct including first and second target byproducts, which are respectively produced by and before the etching process on a to-be-processed layer, obtaining a first index from a ratio of the target byproduct to the non-target byproduct, obtaining a second index by subtracting an emission intensity of the second target byproduct from the first index, obtaining a third index by integrating the second index on a time interval, and estimating a result of the etching process and presence or absence of a failure, based on the third index.
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公开(公告)号:US11216974B2
公开(公告)日:2022-01-04
申请号:US16768765
申请日:2017-12-14
Inventor: Chi-yul Yoon , Sang Yoon Han , Sang Hwa Lee , Yeongil Jang , Nam Ik Cho
Abstract: The disclosure relates to a method of determining a gaze distance, the method including obtaining a plurality of images by capturing each of both eyes of a user, determining, from each of the plurality of images, a corner point located at an edge of the eye, a location of a pupil, and an eye contour, determining each of gaze directions of both of the eyes based on a difference between a reference point and the location of the pupil, wherein the reference point is determined based on the eye contour and a location of the corner point, and determining a gaze distance based on a difference between the gaze directions of both of the eyes.
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