公开(公告)号：US20170067833A1

公开(公告)日：2017-03-09

申请号：US15203317

申请日：2016-07-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seongsil LEE ,  Jeongho AHN

IPC: G01N21/88 ,  G01N21/47

CPC classification number: G01N21/8806 ,  G01N21/956 ,  G01N2201/0636

Abstract: A substrate inspection apparatus may include a light source, which is configured to emit an incident light. The substrate inspection apparatus may further include a support, a detector, and a light adjuster. The supporting base configured to support a substrate, the detector configured to detect a defect on the substrate, and the light adjuster configured to allow the incident light to be reflected. The detector may be configured to collect a scattering signal. The scattering signal is generated from an optical interaction between an evanescent wave and the defect on the substrate, and to detect the defect. The evanescent wave may be generated when the incident light is totally and/or substantially reflected by the light adjuster.

Abstract translation: 基板检查装置可以包括被配置为发射入射光的光源。 基板检查装置还可以包括支撑件，检测器和光调节器。 所述支撑基座被配置为支撑基板，所述检测器被配置为检测所述基板上的缺陷，以及所述光调节器被配置为允许所述入射光被反射。 检测器可以被配置成收集散射信号。 散射信号是从湮灭波与基板上的缺陷之间的光学相互作用产生的，并且用于检测缺陷。 当入射光完全和/或基本上被光调节器反射时，可以产生ev逝波。