公开(公告)号：US20230041075A1

公开(公告)日：2023-02-09

申请号：US17671021

申请日：2022-02-14

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jeong-Lim KIM ,  Jae Myoung LEE ,  Sung Gon JUNG

IPC: G03F1/36

Abstract: An optical proximity correction method includes designing a mask design. The designing of the mask design includes setting a reference point of the mask design, calculating a plurality of chief ray angles of a plurality of points of interest on the mask design, respectively, each of the plurality of points of interest having a corresponding distance from the reference point, finding, among the plurality of points of interest, a first point of interest having a maximum chief ray angle among the plurality of chief ray angles, a distance of the first point of interest from the reference point being set as a deteriorated distance, and compensating for distortion of an image to be transferred from a pattern located at the deteriorated distance from the reference point of the mask design.