公开(公告)号：US20250147423A1

公开(公告)日：2025-05-08

申请号：US18737042

申请日：2024-06-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： JINJOO KIM ,  DAIKI MINAMI ,  WON-JOON SON ,  HYUNJI SONG ,  SONGSE YI

IPC: G03F7/38

Abstract: Disclosed are photolithographic rinse compositions and methods of forming patterns using the same, the photolithographic rinse compositions including a gemini-type surfactant having a main chain including at least two hydrophobic groups and at least one hydrophilic group and at least two side chains branching from the main chain and including a hydrophilic group-including functional group, and a solvent.