公开(公告)号：US20230229083A1

公开(公告)日：2023-07-20

申请号：US18148449

申请日：2022-12-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： JUHYEON PARK ,  JI YUP KIM ,  JINJOO KIM ,  HYUNWOO KIM ,  SUNG HWAN PARK

IPC: G03F7/039 ,  C08F220/28 ,  H01L21/027 ,  H01L21/3213 ,  H01L21/311 ,  H01L21/308

CPC classification number: G03F7/039 ,  C08F220/281 ,  H01L21/0274 ,  H01L21/32139 ,  H01L21/31144 ,  H01L21/308 ,  G03F7/2004

Abstract: Provided are photoresist compositions for EUV and methods for manufacturing a semiconductor device using the same. The photoresist compositions for EUV include a photosensitive resin, a photoacid generator, and an additive, wherein the additive comprises a copolymer including a first repeating unit that includes a fluoroalkyl group or hydrocarbon group substituted with one or more fluoroalkyl group(s), and a second repeating unit that includes a sulfonic acid group and an amide group.

公开(公告)号：US20250147423A1

公开(公告)日：2025-05-08

申请号：US18737042

申请日：2024-06-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： JINJOO KIM ,  DAIKI MINAMI ,  WON-JOON SON ,  HYUNJI SONG ,  SONGSE YI

IPC: G03F7/38

Abstract: Disclosed are photolithographic rinse compositions and methods of forming patterns using the same, the photolithographic rinse compositions including a gemini-type surfactant having a main chain including at least two hydrophobic groups and at least one hydrophilic group and at least two side chains branching from the main chain and including a hydrophilic group-including functional group, and a solvent.

公开(公告)号：US20250093784A1

公开(公告)日：2025-03-20

申请号：US18652444

申请日：2024-05-01

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： DAIKI MINAMI ,  JINJOO KIM ,  HYUNJI SONG ,  JI YOUNG PARK ,  SEUNGYEOL BAEK

IPC: G03F7/00 ,  G03F7/40 ,  G06F30/20

Abstract: An apparatus includes a processor, a memory electrically connected to the processor and that stores instructions, and a storage unit that stores a photoresist molecular model, a surfactant molecular model, an additive molecular model and a solvent molecular model. The processor is configured by the instructions to perform a molecular dynamics simulation of a cell in which are placed photoresist molecules based on the photoresist molecular model, surfactant molecules based on the surfactant molecular model, additive molecules based on the additive molecular model, and solvent molecules based on the solvent molecular model, and compute a number of first surfactant molecules located in the cell in a vicinity of an interface between a photoresist pattern that includes the photoresist molecules and a solvent that includes the solvent molecules, and a number of second surfactant molecules located in the cell in a vicinity of a surface of the solvent.