公开(公告)号：US20170103925A1

公开(公告)日：2017-04-13

申请号：US15218026

申请日：2016-07-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chol-Min JHON ,  Seok PARK ,  Ho-Hyung JUNG ,  Yang-Kyu KIM ,  Jae-Young LEE

IPC: H01L21/66 ,  H01L21/52 ,  H01L21/78 ,  G01B11/00 ,  G01B11/06

CPC classification number: H01L22/20 ,  G01B11/002 ,  G01B11/0616 ,  G01B2210/56 ,  H01L21/52 ,  H01L21/78 ,  H01L22/12

Abstract: A method for measuring a substrate is provided. The method comprises irradiating a measurement beam into a site box of an identifiable pattern of a substrate, detecting a center position of the irradiated measurement beam, calculating an amount of shift of the center position of the measurement beam from the center position of the site box, and correcting the center position of the measurement beam to the center position of the site box by compensating the calculated amount of shift.