公开(公告)号：US11201052B2

公开(公告)日：2021-12-14

申请号：US16874820

申请日：2020-05-15

申请人： Samsung SDI Co., Ltd.

发明人： Seungwoo Jang ,  Taeksoo Kwak ,  Jin-Hee Bae ,  Hyeonsu Jo ,  Euihyun Kim ,  Kunbae Noh ,  Jun Sakong ,  Chungheon Lee ,  Wanhee Lim ,  Byeonggyu Hwang

IPC分类号： H01L21/02 ,  C01B21/087 ,  C01B33/12 ,  H01L27/108

摘要： Disclosed is a composition for forming a silica layer including perhydropolysilazane (PHPS) and a solvent, wherein in an 1H-NMR spectrum of the perhydropolysilazane (PHPS) in CDCl3, when a peak derived from N3SiH1 and N2SiH2 is referred to as Peak 1 and a peak derived from NSiH3 is referred to as Peak 2, a ratio (P1/(P1+P2)) of an area (P1) of Peak 1 relative to a total area (P1+P2) of the Peak 1 and Peak 2 is greater than or equal to 0.77, and when an area from a minimum point between the peaks of Peak 1 and Peak 2 to 4.78 ppm is referred to as a Region B and an area from 4.78 ppm to a minimum point of Peak 1 is referred to as a Region A of the area of Peak 1, a ratio (PA/PB) of an area (PA) of Region A relative to an area (PB) of Region B is greater than or equal to about 1.5.

公开(公告)号：US20210324235A1

公开(公告)日：2021-10-21

申请号：US17224363

申请日：2021-04-07

申请人： Samsung SDI Co., Ltd.

发明人： Wanhee LIM ,  Hyeonsu Jo ,  Byeonggyu Hwang ,  Taeksoo Kwak ,  Jin-Hee Bae ,  Seungwoo Jang

IPC分类号： C09D183/16 ,  B05D1/00 ,  C08G77/62 ,  B05D3/10

摘要： Provided is a composition for forming a silica layer including a silicon-containing polymer, and a solvent, wherein the silicon-containing polymer has a weight average molecular weight (Mw) of 8,000 g/mol to 15,000 g/mol, and wherein a content of nitrogen atoms of the silicon-containing polymer measured by a kjeldahl titration method is 25 wt % to 30 wt % based on a total weight of the silicon-containing polymer.