专利检索 ap:("Samsung SDI Co., Ltd.") AND inv:"Yoonyoung Koo" 第 1 页

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发明授权
Composition for forming silica layer, manufacturing method for silica layer, and silica layer 有权

公开(公告)号：US11518909B2

公开(公告)日：2022-12-06

申请号：US16645343

申请日：2018-02-13

申请人： Samsung SDI Co., Ltd.

发明人： Kunbae Noh , Taeksoo Kwak , Junyoung Jang , Yoonyoung Koo , Yonggoog Kim , Jingyo Kim , Jin-Hee Bae , Jun Sakong , Jinwoo Seo , Sooyeon Sim , Huichan Yun , Jiho Lee , Kwen-Woo Han , Byeong Gyu Hwang

IPC分类号： C09D183/16 , H01L21/02 , H01L21/306

摘要： Provided is a composition for forming a silica layer, the composition containing a silicon-containing polymer and a solvent, wherein a silica layer formed of the composition for forming the silica layer satisfies Relation 1. The definition of Relation 1 is as described in the specification. The definition of Relation 1 is the same as described in the specification.