Oxide coated cutting tool
    1.
    发明申请
    Oxide coated cutting tool 有权
    氧化物涂层切割工具

    公开(公告)号:US20040253446A1

    公开(公告)日:2004-12-16

    申请号:US10807376

    申请日:2004-03-24

    Applicant: Sandvik AB

    Inventor: Bjorn Ljungberg

    Abstract: The present invention relates to a method of depositing a crystalline null-Al2O3-layer onto a cutting tool insert by Chemical Vapor Deposition at a temperature of from about 625 to about 800null C. The method comprises the following steps: depositing a from about 0.1 to about 1.5 nullm layer of TiCxNyOz where xnullynullz>null1 and z>0, preferably z>0.2; treating said layer at 625-1000null C. in a gas mixture containing from about 0.5 to about 3 vol-% O2, preferably as CO2nullH2 or O2nullH2, for a short period of time from about 0.5 to about 4 min, optionally in the presence of from about 0.5 to about 6 vol-% HCl; and depositing said Al2O3-layer by bringing said treated layer into contact with a gas mixture containing from about 2 to about 10 vol-% of AlCl3, from about 16 to about 40 vol-% of CO2, in H2 and 0.8-2 vol-% of a sulphur-containing agent, preferably H2S, at a process pressure of from about 40 to about 300 mbar. The invention also includes a cutting tool insert with a coating including at least one null-Al2O3-layer according to the invention.

    Abstract translation: 本发明涉及通过化学气相沉积在约625至约800℃的温度下将结晶α-Al 2 O 3层沉积到切削刀片上的方法。该方法包括以下步骤:将约0.1 至约1.5μm的TiC x N y O z层,其中x + y + z> = 1且z> 0,优选z> 0.2; 在包含约0.5至约3体积%O 2,优选作为CO 2 + H 2或O 2 + H 2的气体混合物中在625-1000℃下处理所述层,时间为约0.5至约4分钟, 任选地在约0.5至约6体积%HCl的存在下; 并通过使所述处理层与含有约2至约10体积%的AlCl 3,约16至约40体积%的CO 2,在H 2和0.8-2体积%的CO 2的气体混合物接触来沉积所述Al 2 O 3层, %的含硫试剂,优选H 2 S.在约40至约300毫巴的工艺压力下。 本发明还包括具有包括根据本发明的至少一个α-Al 2 O 3层的涂层的切削工具刀片。

    Oxide coated cutting tool
    2.
    发明申请
    Oxide coated cutting tool 有权
    氧化物涂层切割工具

    公开(公告)号:US20040081824A1

    公开(公告)日:2004-04-29

    申请号:US10688966

    申请日:2003-10-21

    Inventor: Bjorn Ljungberg

    Abstract: A body is at least partially coated with one or more refractory layers of which at least one layer is of a fine grained null-Al2O3. Said null-Al2O3 layer has equiaxed grains with an average grain size of

    Abstract translation: 至少部分地涂有一个或多个难熔层,其中至少一层是细晶粒的κBa2O3。 所述kappa-Al 2 O 3层具有平均晶粒尺寸<0.5μm的等轴晶粒。 Al 2 O 3层还具有至少一个含有Al,Si和O的子层。通过在Al 2 O 3处理期间周期性地引入卤化硅,优选SiCl 4,获得了细粒度的κB-Al2O3微结构。

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