公开(公告)号：US20130052475A1

公开(公告)日：2013-02-28

申请号：US13589416

申请日：2012-08-20

申请人： Sang Hoon KIM ,  Ji Young BYUN ,  Heon Phil HA ,  Chae Sun LIM ,  Do Hyung KIM ,  Jeong Beom CHOI

发明人： Sang Hoon KIM ,  Ji Young BYUN ,  Heon Phil HA ,  Chae Sun LIM ,  Do Hyung KIM ,  Jeong Beom CHOI

IPC分类号： C22C3/00 ,  B32B15/00

CPC分类号： C22C3/00 ,  Y10T428/12431

摘要： Provided are a method of fabricating a porous thin film structure, by forming a thin film from at least two elements, followed by selectively removing the certain element using a dry etching process, and a porous thin film structure fabricated by the same. Because all processes of the method of fabricating a porous thin film structure are dry processes, process control is simply accomplished, environmental impact is low, and mass production is possible, in contrast to when using a typical wet process such as electrodeposition or dealloying. Also, since a level of porosity is easily controlled and maintained uniform, a mesoporous thin film structure showing a reproducible level of sensitivity when used as a sensor can be fabricated.

摘要翻译： 提供一种制造多孔薄膜结构的方法，通过从至少两个元素形成薄膜，然后使用干蚀刻工艺选择性地去除某些元素，以及由其制造的多孔薄膜结构。 由于制造多孔薄膜结构的方法的所有方法都是干法，与使用典型的湿法如电沉积或脱合金相比，简单地实现了过程控制，环境影响低，大量生产是可能的。 此外，由于可以容易地控制和保持孔隙度的水平，所以可以制造当用作传感器时显示出可重现的灵敏度水平的介孔薄膜结构。

公开(公告)号：US20120289397A1

公开(公告)日：2012-11-15

申请号：US13288129

申请日：2011-11-03

申请人： Ji Young BYUN ,  Seung Hee HAN ,  Heon Phil HA ,  Byung Yong YU ,  Sang Hoon KIM ,  Do Hyung KIM ,  Chae Sun LIM

发明人： Ji Young BYUN ,  Seung Hee HAN ,  Heon Phil HA ,  Byung Yong YU ,  Sang Hoon KIM ,  Do Hyung KIM ,  Chae Sun LIM

IPC分类号： B01J37/34 ,  H01J37/317 ,  B82B3/00

CPC分类号： B01J37/349 ,  B01J21/04 ,  B01J23/40 ,  B01J23/42 ,  B01J23/70 ,  B01J35/006 ,  C01B3/326 ,  C01B2203/0261 ,  C01B2203/107 ,  C01B2203/1082 ,  C01B2203/1211 ,  C23C14/48 ,  Y02P20/52

摘要： Provided is a method of fabricating a nano particle complex catalyst including generating a plasma ion of a solid element and performing plasma ion implantation to carry a catalyst component of the solid element in a porous carrier. In the method, a pulse direct current voltage is applied to the deposition source to generate the plasma ion of the solid element, and a synchronized voltage is applied to the porous carrier, thereby instantly applying a pulse high voltage to the solid element. The ionized solid element is accelerated toward the porous carrier by the pulse high voltage instantly applied to the solid element, thereby performing the ion implantation.

摘要翻译： 提供一种制造纳米颗粒复合催化剂的方法，包括产生固体元素的等离子体离子并进行等离子体离子注入，以将固体元素的催化剂组分携带在多孔载体中。 在该方法中，向沉积源施加脉冲直流电压以产生固体元素的等离子体离子，向多孔载体施加同步电压，从而立即向固体元件施加脉冲高电压。 电离固体元素通过立即施加到固体元件的脉冲高电压朝向多孔载体加速，从而进行离子注入。