公开(公告)号：US20070069151A1

公开(公告)日：2007-03-29

申请号：US11237554

申请日：2005-09-28

申请人： Scott Stovall ,  Benyamin Buller ,  Jimmy Iskandar ,  Ming Yu

发明人： Scott Stovall ,  Benyamin Buller ,  Jimmy Iskandar ,  Ming Yu

IPC分类号： G01K1/08

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304

摘要： A system and method of determining shape and position corrections of a beam such as a particle or other beam used in a system such as a particle beam lithography. The method of providing corrected deflector voltages may include determining a voltage step value by subtracting a previous deflector voltage value with a current deflector voltage value; determining a plurality of correction values using the voltage step value and an exposure time for the current deflector voltage value; selecting a current voltage correction value from the plurality of correction values using the current deflector voltage value; and calculating a corrected deflector voltage value by adding the current voltage correction value to the current deflector voltage value.

摘要翻译： 确定诸如粒子束光刻系统中使用的粒子或其他束的束的形状和位置校正的系统和方法。 提供校正的偏转器电压的方法可以包括通过用电流偏转器电压值减去先前的偏转器电压值来确定电压阶跃值; 使用所述电压阶跃值和所述电流偏转器电压值的曝光时间来确定多个校正值; 使用所述电流偏转器电压值从所述多个校正值中选择当前电压校正值; 以及通过将当前电压校正值与当前偏转器电压值相加来计算校正的偏转器电压值。

公开(公告)号：US07417233B2

公开(公告)日：2008-08-26

申请号：US11237554

申请日：2005-09-28

申请人： Scott C. Stovall ,  Benyamin Buller ,  Jimmy Iskandar ,  Ming Lun Yu

发明人： Scott C. Stovall ,  Benyamin Buller ,  Jimmy Iskandar ,  Ming Lun Yu

IPC分类号： G21K1/08

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304

摘要： A system and method of determining shape and position corrections of a beam such as a particle or other beam used in a system such as a particle beam lithography. The method of providing corrected deflector voltages may include determining a voltage step value by subtracting a previous deflector voltage value with a current deflector voltage value; determining a plurality of correction values using the voltage step value and an exposure time for the current deflector voltage value; selecting a current voltage correction value from the plurality of correction values using the current deflector voltage value; and calculating a corrected deflector voltage value by adding the current voltage correction value to the current deflector voltage value.

摘要翻译： 确定诸如粒子束光刻系统中使用的粒子或其他束的束的形状和位置校正的系统和方法。 提供校正的偏转器电压的方法可以包括通过用电流偏转器电压值减去先前的偏转器电压值来确定电压阶跃值; 使用所述电压阶跃值和所述电流偏转器电压值的曝光时间来确定多个校正值; 使用所述电流偏转器电压值从所述多个校正值中选择当前电压校正值; 以及通过将当前电压校正值与当前偏转器电压值相加来计算校正的偏转器电压值。