Alternating phase shift mask
    1.
    发明授权

    公开(公告)号:US11635679B1

    公开(公告)日:2023-04-25

    申请号:US17032358

    申请日:2020-09-25

    Abstract: An alternating phase-shifting mask (Alt-PSM) comprising a 0° phase portion having a first width and a 180° phase portion having a second width greater than the first width. Example differences between the width of the 180° phase portion and the 0° phase portion may be 10 nm, 15 nm, or 20 nm. An Alt-PSM having phase portions of different widths can have an aerial image intensity transmission graph that is symmetric, for example, at 0.2-0.3 intensity.

    Alternating phase shift mask
    2.
    发明授权

    公开(公告)号:US10859903B1

    公开(公告)日:2020-12-08

    申请号:US15843451

    申请日:2017-12-15

    Abstract: An alternating phase-shifting mask (Alt-PSM) comprising a 0° phase portion having a first width and a 180° phase portion having a second width greater than the first width. Example differences between the width of the 180° phase portion and the 0° phase portion may be 10 nm, 15 nm, or 20 nm. An Alt-PSM having phase portions of different widths can have an aerial image intensity transmission graph that is symmetric, for example, at 0.2-0.3 intensity.

Patent Agency Ranking