IMPRINT METHOD FOR FABRICATION OF LOW DENSITY NANOPORE MEMBRANE

    公开(公告)号:US20230194991A1

    公开(公告)日:2023-06-22

    申请号:US18062225

    申请日:2022-12-06

    CPC classification number: G03F7/2016 B82Y40/00

    Abstract: A method of manufacturing a synthetic nanopore device for DNA sequencing disclosed herein includes providing a base template, forming a guiding layer on top of the base template, and forming a photoresist layer on top of the guiding layer. The photoresist layer is patterned, and the guiding layer is etched for form a guiding pattern. The photoresist layer is removed to form a guiding template and a self-assembled monolayer is deposited on at least a portion of the guiding template to form a patterned template. The patterned template is exposed to one or more etch processes to form a nanoimprint lithography template. A membrane is imprinted with the nanoimprint lithography template to form an array of nanopores in the membrane.

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